Flare value calculation method, flare correction method, and computer program product
First Claim
1. A flare value calculation method comprising:
- calculating an average optical intensity for each of mask patterns when an exposure process is performed on a substrate using a mask pattern group including the mask patterns of a plurality of dimensions;
calculating a pattern correction amount for each of the mask patterns corresponding to the average optical intensity and information about the dimensions of the mask patterns;
preparing post-correction mask patterns by performing pattern correction on each of the mask patterns using the pattern correction amount calculated for each of the mask patterns; and
calculating a flare value of a projection optical system of an exposure apparatus using a pattern average density of the post-correction mask patterns.
5 Assignments
0 Petitions
Accused Products
Abstract
In a flare value calculation method according to an embodiment, an average optical intensity is calculated for each of mask patterns in a case where an exposure process is performed on a substrate using the mask patterns. Then, pattern correction amounts for the mask patterns corresponding to the average optical intensity and information about the dimensions of the mask patterns are calculated for each mask pattern. Then, post-correction mask patterns are prepared by performing pattern correction on each of the mask patterns using the pattern correction amount. Then, a flare value of an optical system of an exposure apparatus is calculated using a pattern average density of the post-correction mask patterns.
-
Citations
19 Claims
-
1. A flare value calculation method comprising:
-
calculating an average optical intensity for each of mask patterns when an exposure process is performed on a substrate using a mask pattern group including the mask patterns of a plurality of dimensions; calculating a pattern correction amount for each of the mask patterns corresponding to the average optical intensity and information about the dimensions of the mask patterns; preparing post-correction mask patterns by performing pattern correction on each of the mask patterns using the pattern correction amount calculated for each of the mask patterns; and calculating a flare value of a projection optical system of an exposure apparatus using a pattern average density of the post-correction mask patterns. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A flare correction method comprising:
-
calculating an average optical intensity for each of mask patterns when an exposure process is performed on a substrate using a mask pattern group including the mask patterns of a plurality of dimensions; calculating a pattern correction amount for each of the mask patterns corresponding to the average optical intensity and information about the dimensions of the mask patterns; preparing post-correction mask patterns by performing pattern correction on each of the mask patterns using the pattern correction amount calculated for each of the mask patterns; calculating a flare value of a projection optical system of an exposure apparatus using a pattern average density of the post-correction mask pattern; and performing flare correction on correction-target mask patterns by changing dimensions of the correction-target mask patterns according to the flare value. - View Dependent Claims (8, 9, 10, 11, 12, 13)
-
-
14. A computer program product comprising a non-transitory computer-readable recording medium storing a plurality of commands which are executable on a computer and configured to calculate a flare value of an optical system of an exposure apparatus, the plurality of commands causing the computer to execute:
-
calculating an average optical intensity for each of mask patterns when an exposure process is performed on a substrate using a mask pattern group including the mask patterns of a plurality of dimensions; calculating a pattern correction amount for each of the mask patterns corresponding to the average optical intensity and information about the dimensions of the mask patterns; preparing post-correction mask patterns by performing pattern correction on each of the mask patterns using the pattern correction amount calculated for each of the mask patterns; and calculating a flare value of a projection optical system of an exposure apparatus using a pattern average density of the post-correction mask patterns. - View Dependent Claims (15, 16, 17, 18, 19)
-
Specification