Patterning of antistiction films for electromechanical systems devices
First Claim
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1. A method for selectively removing an antistiction layer in an electromechanical systems apparatus, comprising:
- providing a substrate having a device with a patterned laser absorption layer surrounding the device in a seal pattern;
depositing an antistiction layer as a blanket layer over the substrate and over the laser absorption layer after providing the substrate with the patterned laser absorption layer;
selectively removing the antistiction layer from the seal pattern using a laser; and
sealing the device with epoxy in regions where the antistiction layer was removed.
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Abstract
A laser absorption layer is first selectively formed in a seal pattern region surrounding an array of electromechanical systems elements, followed by depositing an antistiction layer as a blanket layer over the substrate and the laser absorption layer. The antistiction layer is then selectively removed from the seal pattern using a laser. An epoxy sealing material is provided in the seal pattern where the antistiction layer was removed and a backplate is sealed to the substrate using epoxy.
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Citations
17 Claims
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1. A method for selectively removing an antistiction layer in an electromechanical systems apparatus, comprising:
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providing a substrate having a device with a patterned laser absorption layer surrounding the device in a seal pattern; depositing an antistiction layer as a blanket layer over the substrate and over the laser absorption layer after providing the substrate with the patterned laser absorption layer; selectively removing the antistiction layer from the seal pattern using a laser; and sealing the device with epoxy in regions where the antistiction layer was removed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification