Lithographic apparatus and device manufacturing method

• US 8,446,568 B2
• Filed: 06/08/2010
• Issued: 05/21/2013
• Est. Priority Date: 11/12/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Derksen, Antonius Theodorus Anna Maria, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Lof, Joeri, Loopstra, Erik Roelof, Mulkens, Johannes Catharinus Hubertus, Jansen, Hans, Verspay, Jacobus Johannus Leonardus Hendricus, Straaijer, Alexander, Streefkerk, Bob
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/796,482
• Publication Number:
  US 20110122376A1
• Time in Patent Office: 1,078 Days
• Field of Search: 355/72, 355/53, 355/30
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate; and

a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

2. The apparatus according to claim 1, comprising a frame supporting the projection system and a projection system frame actuator to apply the force related to the weight transfer to the frame.

3. The apparatus according to claim 1, wherein the member of the liquid supply system is connected to a frame supporting the projection system.

4. The apparatus according to claim 3, comprising a liquid supply member actuator connecting the member to the frame and configured to displace the member relative to the frame.

5. The apparatus according to claim 1, wherein the force related to the weight transfer is a force sufficient to keep the projection system substantially in place.

6. The apparatus according to claim 1, wherein the force related to the weight is applied in a feed forward manner to prevent or reduce displacement of the projection system.

7. The apparatus according to claim 1, comprising a force sensor configured to measure a change of force attributable to the weight transfer and wherein the controller is configured to determine the force to be applied to the projection system from the change of force.

8. The apparatus according to claim 1, wherein the controller is configured to determine a change of force attributable to the weight transfer using data from a control loop of a substrate table actuator, a projection system frame actuator, a liquid supply system actuator, or any combination thereof and to determine the force to be applied to the projection system from the change of force.

9. The apparatus according to claim 1, wherein the controller is configured to, when the weight of the member is transferred from the substrate table to the projection system, determine a change of force in a substrate table actuator, a liquid supply member actuator or both and control the application to the projection system of an increased force to at least partly compensate for a displacement of the projection system caused or to be caused by the receipt of the weight of the member by the projection system.

10. The apparatus according to claim 1, wherein the controller is configured to, when the weight of the member is transferred from the projection system to the substrate table, determine a change of force in a substrate table actuator, a liquid supply member actuator or both and control the application to the projection system of a reduced force to at least partly compensate for a displacement of the projection system caused or to be caused by the loss of the weight of the member by the projection system.

11. A device manufacturing method comprising:

providing a liquid to a space between a projection system and a substrate using a liquid supply system;

projecting a patterned beam of radiation, through the liquid, onto a target portion of the substrate using the projection system; and

controlling the application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

12. The method according to claim 11, comprising applying the force related to the weight transfer to the frame supporting the projection system.

13. The method according to claim 11, wherein the member of the liquid supply system is connected to a frame supporting the projection system.

14. The method according to claim 13, comprising displacing the member relative to the frame using an actuator connecting the member to the frame.

15. The method according to claim 11, wherein the force related to the weight transfer is a force sufficient to keep the projection system substantially in place.

16. The method according to claim 11, comprising applying the force related to the weight in a feed forward manner to prevent or reduce displacement of the projection system.

17. The method according to claim 11, comprising measuring a change of force attributable to the weight transfer and determining the force to be applied to the projection system from the change of force.

18. The method according to claim 11, comprising determining a change of force attributable to the weight transfer using data from a control loop of a substrate table actuator;

a projection system frame actuator, a liquid supply system actuator, or any combination thereof and determining the force to be applied to the projection system from the change of force.

19. The method according to claim 11, wherein, when the weight of the member is transferred from the substrate table to the projection system, determining a change of force in a substrate table actuator, a liquid supply member actuator or both and controlling the application to the projection system of an increased force to at least partly compensate for a displacement of the projection system caused or to be caused by the receipt of the weight of the member by the projection system.

20. The method according to claim 11, wherein, when the weight of the member is transferred from the projection system to the substrate table, determining a change of force in a substrate table actuator, a liquid supply member actuator or both and controlling the application to the projection system of a reduced force to at least partly compensate for a displacement of the projection system caused or to be caused by the loss of the weight of the member by the projection system.