UV-reflective structural color
First Claim
1. A multilayer structure comprising:
- a plurality of alternating layers of a low index of refraction material and a high index of refraction material;
said plurality of alternating layers of said low index of refraction material and said high index of refraction material reflecting electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region;
said plurality of alternating layers of said low index of refraction material and said high index of refraction material having a layered structure described by [A 0.5 qH pL (qH pL)N 0.5 qH G], where;
A represents air;
q is a multiplier of a quarter-wave thickness of said high index of refraction material;
H is the quarter wave thickness of the high refracting index material for a given wavelength λ
0;
p is a multiplier of a quarter-wave thickness of said low index of refraction material;
L is the quarter-wave thickness of the low refracting index material for said given wavelength λ
0;
N represents the total number of layers between bounding half layers of said high index of refraction material; and
G represents a substrate.
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Accused Products
Abstract
The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL≠nHdH≠λ0/4, can be expressed as [A 0.5 qH pL(qH pL)N 0.5 qH G], where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5 qH); G represents a substrate and A represents air.
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Citations
11 Claims
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1. A multilayer structure comprising:
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a plurality of alternating layers of a low index of refraction material and a high index of refraction material; said plurality of alternating layers of said low index of refraction material and said high index of refraction material reflecting electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region; said plurality of alternating layers of said low index of refraction material and said high index of refraction material having a layered structure described by [A 0.5 qH pL (qH pL)N 0.5 qH G], where; A represents air; q is a multiplier of a quarter-wave thickness of said high index of refraction material; H is the quarter wave thickness of the high refracting index material for a given wavelength λ
0;p is a multiplier of a quarter-wave thickness of said low index of refraction material; L is the quarter-wave thickness of the low refracting index material for said given wavelength λ
0;N represents the total number of layers between bounding half layers of said high index of refraction material; and G represents a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A process for making a multilayer structure that is an ultraviolet-reflective structural color, the process comprising:
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providing a low index of refraction material and a high index of refraction material; fabricating a first layer from the low index of refraction material; fabricating a second layer from the high index of refraction material adjacent to and in contact with the first layer; the first layer and the second layer having a thickness of pL and qH, respectively, and being part of an ultraviolet-reflective structural color layered structure described by [A 0.5 qH pL (qH pL)N 0.5 qH G], where; A represents air; q is a multiplier of a quarter-wave thickness of said high index of refraction material; H is the quarter wave thickness of the high refracting index material for a given wavelength λ
0;p is a multiplier of a quarter-wave thickness of said low index of refraction material; L is the quarter-wave thickness of the low refracting index material for said given wavelength λ
0;N represents the total number of layers between bounding half layers of said high index of refraction material; and G represents a substrate. - View Dependent Claims (10, 11)
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Specification