Exposure apparatus, method for producing device, and method for controlling exposure apparatus
First Claim
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which projects an image of a pattern onto the substrate;
a liquid supply system which supplies the liquid to a space between the projection optical system and the substrate during the exposure, wherein the liquid supply system stops the supply of the liquid when any abnormality is detected; and
a liquid recovery system which recovers the liquid supplied by the liquid supply system, wherein the abnormality includes abnormality of recovery operation performed by the liquid recovery system.
2 Assignments
0 Petitions
Accused Products
Abstract
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
-
Citations
51 Claims
-
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects an image of a pattern onto the substrate; a liquid supply system which supplies the liquid to a space between the projection optical system and the substrate during the exposure, wherein the liquid supply system stops the supply of the liquid when any abnormality is detected; and a liquid recovery system which recovers the liquid supplied by the liquid supply system, wherein the abnormality includes abnormality of recovery operation performed by the liquid recovery system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
-
-
27. An exposure method comprising:
-
supplying a liquid to a space between a projection optical system and a substrate by a liquid supply system; recovering the supplied liquid by a liquid recovery system; and exposing the substrate via the supplied liquid, wherein the liquid supply system stops the supply of the liquid when any abnormality is detected, and the abnormality includes abnormality of recovery operation performed by the liquid recovery system. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51)
-
Specification