Interspinous process implants and methods of use

• US 8,454,659 B2
• Filed: 06/29/2007
• Issued: 06/04/2013
• Est. Priority Date: 10/29/2002
• Status: Active Grant

• Current Assignee: Medtronic Europe SARL (Medtronic Plc)
• Original Assignee: Kyphon SARL (Medtronic Plc)
• Inventors: Zucherman, James F., Hsu, Ken Y., Winslow, Charles J., Yerby, Scott A., Flynn, John J., Mitchell, Steven T., Markwart, John A.
• Primary Examiner(s): Isabella, David
• Assistant Examiner(s): COBURN, LESLIE ANN
• Application Number:
  US11/771,092
• Publication Number:
  US 20080033559A1
• Time in Patent Office: 2,167 Days
• Field of Search: 606/246, 606/248, 606/249, 606/279, 623/17.16, 411/340, 411/409
• US Class Current: 606/248
• CPC Class Codes: A61B 17/7047 Clamps comprising opposed elements which grasp one vertebra between them
• CPC Class Codes: A61B 17/7053 with parts attached to bones or to each other by flexible wires, straps, sutures or cables
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 17/7068 Devices comprising separate rigid parts, assembled in situ, to bear on each side of spinous processes; Tools therefor
• CPC Class Codes: A61B 17/842 Flexible wires, bands or straps A61B17/72, A61B17/82, A61B17/86 take precedence

Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

Claims

1. A method, comprising:

inserting a spinal implant proximate a pair of adjacent spinous processes;

the implant having a forward portion and a rear portion disposed along a longitudinal axis on opposite sides of a central section;

the longitudinal axis extending through the forward portion;

rotating the entire implant about the longitudinal axis while forwardly advancing the implant through an interspinous space between the pair of adjacent spinous processes;

wherein the forward portion has at least one external spiral recess, wherein a height of the external spiral recess relative to the longitudinal axis is largest closet to the central section;

wherein the forward portion has a contiguous outer surface forming a forward tip.

2. The method of claim 1 wherein the rotating comprises rotating the implant so as to distract with the forward portion.

3. The method of claim 1 wherein, during the rotating, the longitudinal axis is disposed normal to a sagittal plane defined by lateral midpoints of the pair of adjacent spinous processes.

4. The method of claim 1 wherein the rotating includes contacting the forward portion with at least one spinous process from the pair of adjacent spinous processes.

5. The method of claim 1 further comprising:

moving the forward portion through an opening in an interspinous ligament from a first side of the interspinous ligament;

the rotating includes rotating the forward portion such that at least the forward portion of the implant exits the interspinous ligament from a second side of the interspinous ligament.

6. The method of claim 1 wherein the rear portion has a rear retention flange configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the central section of the implant is disposed between the pair of adjacent spinous processes.

7. The method of claim 1 wherein the implant is a first implant, the method further comprising:

receiving a second implant in the first implant;

the second implant having a central portion configured to define a space between the pair of adjacent spinous processes.

8. The method of claim 1 wherein:

the implant is a first implant;

the rear portion of the first implant defines a slot configured to receive a second implant.

9. The method of claim 1 wherein the inserting and the rotating are performed percutaneously via a lateral incision.

10. The method of claim 1 wherein the implant is a first implant, the method further comprising, after the rotating, removably coupling a second implant to the first implant.

11. The method of claim 10 further comprising distracting the pair of adjacent spinous processes with the second implant.

12. A method, comprising:

inserting a spinal implant proximate a pair of adjacent spinous processes;

the implant having a forward portion and a rear portion disposed along a longitudinal axis on opposite sides of a central section;

the longitudinal axis extending through the forward portion;

rotating the implant about the longitudinal axis thereof while forwardly advancing the implant through an interspinous space between the pair of adjacent spinous processes;

wherein the forward portion includes a forward tip that narrows in cross-section in a forward direction;

wherein the forward portion includes an external helical ridge;

wherein a height of the external helical ridge, on the forward portion and relative to the longitudinal axis, grows in a rearward direction and the height of the external helical ridge is largest closet to the central section;

wherein the advancing includes advancing the implant such that the central section of the implant is moved into the interspinous space between the pair of adjacent spinous processes so as to extend through a sagittal plane defined by lateral midpoints of the adjacent spinous processes.

13. The method of claim 12 wherein the rotating includes contacting the forward portion with at least one spinous process from the pair of adjacent spinous processes.

14. The method of claim 12 wherein the inserting includes distracting with the forward portion of the implant.

15. The method of claim 12 wherein the implant is a first implant, the method further comprising:

receiving a second implant in the first implant;

the second implant having a central portion configured to define the space between the pair of adjacent spinous processes.

16. The method of claim 12 wherein the rear portion has a rear retention flange configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the central section of the implant is disposed in the interspinous space.

17. The method of claim 12 wherein the inserting and the rotating are performed percutaneously via a lateral incision.

18. The method of claim 12 wherein the implant is a first implant, the method further comprising:

inserting, into the interspinous space, a second implant having a distraction portion configured to distract the pair of adjacent spinous processes after the inserting the first implant;

removably coupling the second implant to the first implant.