Dual hexagonal shaped plasma source
First Claim
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1. A hollow cathode magnetron, comprising:
- a first hexagonal hollow cathode, the cathode including six targets arranged in a hexagonal shape and one or more magnets associated with each of the six targets to generate and maintain a high density plasma;
a second hexagonal hollow cathode including six targets arranged in a hexagonal shape located concentric to the first hexagonal hollow cathode and one or more magnets associated with each of the six targets; and
an anode located beneath the cathode,wherein,each target having one or more magnets with a single radially oriented polarity with respect to the first and second concentric hexagonal hollow cathodes;
magnets associated with adjacent targets having opposite magnetic polarity;
the magnetic field lines of the first and second hexagonal hollow cathode couple to each other;
magnetic field lines are used to generate plasma from the injected inert gas; and
plasma ions impact the six targets of each hexagonal hollow cathode, thereby enhancing the erosion profile of the six targets.
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Abstract
A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cathode.
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Citations
16 Claims
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1. A hollow cathode magnetron, comprising:
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a first hexagonal hollow cathode, the cathode including six targets arranged in a hexagonal shape and one or more magnets associated with each of the six targets to generate and maintain a high density plasma; a second hexagonal hollow cathode including six targets arranged in a hexagonal shape located concentric to the first hexagonal hollow cathode and one or more magnets associated with each of the six targets; and an anode located beneath the cathode, wherein, each target having one or more magnets with a single radially oriented polarity with respect to the first and second concentric hexagonal hollow cathodes; magnets associated with adjacent targets having opposite magnetic polarity; the magnetic field lines of the first and second hexagonal hollow cathode couple to each other; magnetic field lines are used to generate plasma from the injected inert gas; and plasma ions impact the six targets of each hexagonal hollow cathode, thereby enhancing the erosion profile of the six targets. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of magnetron sputtering, comprising:
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generating a high density plasma within a cathode of a hexagonal shaped hollow cathode magnetron wherein the hexagonal shaped hollow cathode magnetron comprises a first hexagonal hollow cathode and a second hexagonal hollow cathode concentric to the first hexagonal hollow cathode and wherein each hexagonal hollow cathode comprises six targets and each target having one or more magnets with a single radially oriented polarity with respect to the first and second concentric hexagonal hollow cathodes;
magnets associated with adjacent targets having opposite magnetic polarity; and
the magnetic field lines of the first and second hexagonal hollow cathode couple to each other;using the plasma to sputter atoms from a target in the hexagonal shaped hollow cathode magnetron; and forming a tapered magnetic convergent lens between the hexagonal shaped hollow cathode magnetron and a substrate using a plurality of magnets below the hexagonal shaped hollow cathode magnetron, wherein magnetic field lines are aligned in a z-direction and are used to generate plasma from the injected inert gas, wherein plasma ions impact the six targets, thereby enhancing the erosion profile of the six targets. - View Dependent Claims (12, 13, 14, 15, 16)
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Specification