Polymer materials for formation of registered arrays of cylindrical pores
First Claim
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1. A polymeric material comprising:
- a self-assembled block copolymer material within a trench exhibiting a substantially uniform width in a material overlying a substrate, the self-assembled block copolymer material comprising a single row of cylindrical domains of a minority polymer block in a matrix of a majority polymer block, each cylindrical domain of the minority polymer block oriented perpendicular to a floor of the trench and comprising;
a first end substantially uncovered by the matrix of the majority polymer block; and
a second, opposing end covered by the matrix of the majority polymer block; and
another self-assembled block copolymer material overlying the self-assembled block copolymer material and comprising cylindrical domains of another minority polymer block in a matrix of another majority polymer block, each cylindrical domain of the another minority polymer block oriented perpendicular to the floor of the trench and registered to an underlying cylindrical domain of the minority polymer block of the self-assembled block copolymer material.
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Abstract
Methods for fabricating sublithographic, nanoscale polymeric microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
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Citations
20 Claims
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1. A polymeric material comprising:
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a self-assembled block copolymer material within a trench exhibiting a substantially uniform width in a material overlying a substrate, the self-assembled block copolymer material comprising a single row of cylindrical domains of a minority polymer block in a matrix of a majority polymer block, each cylindrical domain of the minority polymer block oriented perpendicular to a floor of the trench and comprising; a first end substantially uncovered by the matrix of the majority polymer block; and a second, opposing end covered by the matrix of the majority polymer block; and another self-assembled block copolymer material overlying the self-assembled block copolymer material and comprising cylindrical domains of another minority polymer block in a matrix of another majority polymer block, each cylindrical domain of the another minority polymer block oriented perpendicular to the floor of the trench and registered to an underlying cylindrical domain of the minority polymer block of the self-assembled block copolymer material. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A polymeric material comprising:
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a self-assembled block copolymer material within a trench in a material overlying a substrate, the self-assembled block copolymer material comprising a single row of cylindrical polymer domains in a polymer matrix domain, each of the cylindrical polymer domains oriented perpendicular to a floor of the trench and parallel to sidewalls of the trench and comprising; a face substantially uncovered by the polymer matrix domain; and an opposing end embedded within and surrounded by the polymer matrix domain; and another self-assembled block copolymer material on the self-assembled block copolymer material and comprising other cylindrical polymer domains in another polymer matrix domain, each of the other cylindrical polymer domains aligned with and located on an underlying cylindrical polymer domain of the self-assembled block copolymer material. - View Dependent Claims (8, 9)
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10. A polymeric material comprising:
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a self-assembled block copolymer material within a trench exhibiting a substantially uniform width in a material, the self-assembled block copolymer material comprising; a single row of cylindrical domains of a minority polymer block within a matrix of a majority polymer block, each cylindrical domain of the minority polymer block oriented perpendicular to a floor of the trench and spaced apart from an adjacent cylindrical domain of the minority polymer block and from sidewalls of the trench by substantially the same distance; and a brush material on the floor of the trench and comprising a bilayer of the majority polymer block and the minority polymer block, the minority polymer block wetting the floor of the trench; and another self-assembled block copolymer material overlying the self-assembled block copolymer material and comprising cylindrical domains of another minority polymer block within a matrix of another majority polymer block, each cylindrical domain of the another minority polymer block oriented perpendicular to the floor of the trench and registered to an underlying cylindrical domain of the minority polymer block of the self-assembled block copolymer material.
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11. A polymeric material comprising a self-assembled block copolymer material within a trench exhibiting a substantially uniform width in a material, the self-assembled block copolymer material comprising a single row of cylindrical polymer domains within a polymer matrix, each of the cylindrical polymer domains oriented perpendicular to a floor and the trench and parallel to sidewalls of the trench and comprising substantially uncovered by the polymer matrix and an opposing end covered by the polymer matrix.
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12. A polymeric material comprising:
a self-assembled block copolymer material within a trench in a material and comprising; a single row of cylinders of a first polymer block within a matrix of a second polymer block of a block copolymer material, each cylinder of the first polymer block oriented perpendicular to a floor of the trench and comprising; a first end substantially uncovered by the matrix of the second polymer block; and a second, opposing end embedded within and surrounded by the matrix of the second polymer block; and a brush material comprising the first polymer block wetting the floor of the trench, the sidewalls of the trench, and ends of the trench.
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13. A polymeric material comprising:
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a self-assembled block copolymer within trenches each exhibiting a substantially uniform width in a material, portions of the self-assembled block copolymer material within the trenches each comprising a single row of cylinders of a minority polymer block within a matrix of a majority polymer block, each cylinder of the minority polymer block oriented perpendicular to floors of the trenches and comprising; a face substantially uncovered by the matrix of the majority polymer block; and an opposing end covered by the matrix of the majority polymer block; and another self-assembled block copolymer material overlying the self-assembled block copolymer material and comprising cylinders of another minority polymer block within a matrix of a another majority polymer block, at least some of the cylinders of the another minority polymer block oriented perpendicular to the floors of the trenches and registered to underlying cylinders of the minority polymer block of the self-assembled block copolymer. - View Dependent Claims (14, 15, 16, 17)
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18. A polymeric material comprising:
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a base material within a trench exhibiting a substantially uniform width in a material, the base material comprising a single row of polymer cylinders within a polymer matrix, each of the polymer cylinders oriented perpendicular to a floor of the trench and parallel to sidewalls of the trench; and a polymer material over the base material and comprising additional polymer cylinders in another polymer matrix, each of the additional polymer cylinders registered to an underlying polymer cylinder of the base material. - View Dependent Claims (19, 20)
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Specification