×

Polymer materials for formation of registered arrays of cylindrical pores

  • US 8,455,082 B2
  • Filed: 02/14/2012
  • Issued: 06/04/2013
  • Est. Priority Date: 04/21/2008
  • Status: Active Grant
First Claim
Patent Images

1. A polymeric material comprising:

  • a self-assembled block copolymer material within a trench exhibiting a substantially uniform width in a material overlying a substrate, the self-assembled block copolymer material comprising a single row of cylindrical domains of a minority polymer block in a matrix of a majority polymer block, each cylindrical domain of the minority polymer block oriented perpendicular to a floor of the trench and comprising;

    a first end substantially uncovered by the matrix of the majority polymer block; and

    a second, opposing end covered by the matrix of the majority polymer block; and

    another self-assembled block copolymer material overlying the self-assembled block copolymer material and comprising cylindrical domains of another minority polymer block in a matrix of another majority polymer block, each cylindrical domain of the another minority polymer block oriented perpendicular to the floor of the trench and registered to an underlying cylindrical domain of the minority polymer block of the self-assembled block copolymer material.

View all claims
  • 7 Assignments
Timeline View
Assignment View
    ×
    ×