Exposure apparatus and device manufacturing method
First Claim
1. An exposure apparatus in which a substrate is exposed via a projection optical system, the apparatus comprising:
- a first stage which is movable relative to the projection optical system;
a second stage which is movable relative to the projection optical system; and
a liquid immersion system that forms a liquid immersion region of a liquid under the projection optical system,wherein the first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid of the liquid immersion region does not leak out from between the first and second stages while the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.
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Abstract
An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and a liquid immersion system that is capable of forming a liquid immersion region of a liquid under the projection optical system. The first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.
25 Citations
39 Claims
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1. An exposure apparatus in which a substrate is exposed via a projection optical system, the apparatus comprising:
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a first stage which is movable relative to the projection optical system; a second stage which is movable relative to the projection optical system; and a liquid immersion system that forms a liquid immersion region of a liquid under the projection optical system, wherein the first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid of the liquid immersion region does not leak out from between the first and second stages while the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 24, 25, 26, 27, 28, 29)
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8. An immersion exposure apparatus comprising:
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a projection optical system having a final optical element by which an image of a pattern is projected onto a substrate; a first stage which is movable relative to the projection optical system, the first stage having a substrate holder on which the substrate is held and having a first overhang portion on one side; a second stage which is movable relative to the projection optical system, the second stage having a second overhang portion on one side; a liquid immersion system that surrounds the final optical element of the projection optical system and that forms a liquid immersion region of a liquid under the final optical element of projection optical system; and a controller that controls movement of the first and second stages to cause the liquid immersion region to be moved from an upper surface of one of the first and second overhang portions to an upper surface of the other of the first and second overhang portions in a state in which the first overhang portion and the second overhang portion are brought close to or in contact with each other such that the liquid of the liquid immersion region does not leak out from between the first and second stages, while the liquid remains in contact with a lower surface of the final optical element of the projection optical system. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 30, 31, 32, 33, 34, 35)
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16. An immersion exposure method comprising:
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forming a liquid immersion region of a liquid under a projection optical system, the liquid immersion region being formed between the projection optical system and an upper surface of one of a first stage and a second stage; and moving the liquid immersion region from the upper surface of the one of the first and second stages to an upper surface of the other of the first and second stages, the moving taking place while the first and second stages are in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid of the liquid immersion region does not leak out from between the first and second stages while the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions while liquid is present in the liquid immersion region. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 36, 37, 38, 39)
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Specification