Environmental system including vacuum scavenge for an immersion lithography apparatus
First Claim
1. A liquid containment system used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate, the system comprising:
- a liquid containment member which confines the liquid, the liquid containment member including a channel to remove the liquid; and
an actuator coupled to the liquid containment member and by which the liquid containment member is moved,whereinthe substrate is movable below the liquid containment member and is movable relative to the liquid containment member,a gap is formed between the liquid containment member and the substrate when the substrate is positioned under the optical member, andthe liquid is removed from the gap between the liquid containment member and the substrate through the channel of the liquid containment member.
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Abstract
A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.
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Citations
45 Claims
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1. A liquid containment system used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate, the system comprising:
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a liquid containment member which confines the liquid, the liquid containment member including a channel to remove the liquid; and an actuator coupled to the liquid containment member and by which the liquid containment member is moved, wherein the substrate is movable below the liquid containment member and is movable relative to the liquid containment member, a gap is formed between the liquid containment member and the substrate when the substrate is positioned under the optical member, and the liquid is removed from the gap between the liquid containment member and the substrate through the channel of the liquid containment member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A liquid immersion lithography apparatus comprising:
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a projection system having an optical member, a substrate being exposed through a liquid between the optical member of the projection system and the substrate; a liquid containment member which confines the liquid, the liquid containment member including a channel to remove the liquid; a stage on which the substrate is mounted; and an actuator coupled to the liquid containment member and by which the liquid containment member is moved, wherein; the stage, on which the substrate is mounted, moves below the liquid containment member and moves relative to the liquid containment member, a gap is formed between the liquid containment member and the substrate when the substrate is under the optical member, and the liquid is removed from the gap between the liquid containment member and the substrate through the channel of the liquid containment member. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A liquid immersion lithography method comprising:
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moving a substrate below and relative to an optical member of a projection system and a liquid containment member; exposing the substrate through a liquid which is confined on a portion of an upper surface of the substrate by the liquid containment member; removing the liquid from a gap between the liquid containment member and the substrate through a channel of the liquid containment member; and moving the liquid containment member by an actuator that is coupled to the liquid containment member. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
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Specification