Environmental system including vacuum scavenge for an immersion lithography apparatus

• US 8,456,610 B2
• Filed: 03/20/2009
• Issued: 06/04/2013
• Est. Priority Date: 04/10/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hazelton, Andrew J., Sogard, Michael
• Primary Examiner(s): Nguyen, Hung Henry
• Assistant Examiner(s): Whitesell Gordon, Steven H
• Application Number:
  US12/382,661
• Publication Number:
  US 20090180096A1
• Time in Patent Office: 1,537 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77, 430/30, 359/820
• US Class Current: 355/53
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

Claims

1. A liquid containment system used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate, the system comprising:

a liquid containment member which confines the liquid, the liquid containment member including a channel to remove the liquid; and

an actuator coupled to the liquid containment member and by which the liquid containment member is moved,

wherein

the substrate is movable below the liquid containment member and is movable relative to the liquid containment member,

a gap is formed between the liquid containment member and the substrate when the substrate is positioned under the optical member, and

the liquid is removed from the gap between the liquid containment member and the substrate through the channel of the liquid containment member.

2. The system of claim 1, wherein a height of the liquid containment member is adjusted by moving the liquid containment member by the actuator.

3. The system of claim 2, wherein the gap is maintained by adjusting the height of the liquid containment member.

4. The system of claim 3, further comprising a substrate height sensor having an output that is used to adjust the height of the liquid containment member by the actuator.

5. The system of claim 1, wherein the gap is maintained by moving the liquid containment member by the actuator.

6. The system of claim 5, further comprising a substrate height sensor having an output that is used to move the liquid containment member by the actuator.

7. The system of claim 1, further comprising a substrate height sensor having an output that is used to move the liquid containment member by the actuator.

8. The system of claim 1, wherein a vacuum is used in the channel of the liquid containment member to remove the liquid from the gap.

9. The system of claim 8, wherein the removal of the liquid from the gap prevents the liquid from escaping radially outwardly of the gap.

10. The system of claim 1, wherein the liquid containment member contains the liquid on an upper surface of the substrate during an exposure operation in which a portion of the upper surface of the substrate is covered with the liquid and another portion of the upper surface of the substrate is not covered with the liquid.

11. The system of claim 1, wherein the liquid containment member is disposed in the apparatus such that the liquid containment member surrounds the optical member of the projection system.

12. The system of claim 11, wherein the liquid containment member is formed annularly.

13. The system of claim 1, wherein the substrate includes a wafer.

14. A liquid immersion lithography apparatus comprising:

a projection system having an optical member, a substrate being exposed through a liquid between the optical member of the projection system and the substrate;

a liquid containment member which confines the liquid, the liquid containment member including a channel to remove the liquid;

a stage on which the substrate is mounted; and

an actuator coupled to the liquid containment member and by which the liquid containment member is moved,

wherein;

the stage, on which the substrate is mounted, moves below the liquid containment member and moves relative to the liquid containment member,

a gap is formed between the liquid containment member and the substrate when the substrate is under the optical member, and

the liquid is removed from the gap between the liquid containment member and the substrate through the channel of the liquid containment member.

15. The apparatus of claim 14, wherein a height of the liquid containment member is adjusted by moving the liquid containment member by the actuator.

16. The apparatus of claim 15, wherein the gap is maintained by adjusting the height of the liquid containment member.

17. The apparatus of claim 16, further comprising a substrate height sensor having an output that is used to adjust the height of the liquid containment member by the actuator.

18. The apparatus of claim 14, wherein the gap is maintained by moving the liquid containment member by the actuator.

19. The apparatus of claim 18, further comprising a substrate height sensor having an output that is used to adjust the height of the liquid containment member by the actuator.

20. The apparatus of claim 14, wherein the gap is controlled by moving the liquid containment member.

21. The apparatus of claim 14, further comprising a substrate height sensor having an output that is used to move the liquid containment member by the actuator.

22. The apparatus of claim 14, wherein a vacuum is used in the channel of the liquid containment member to remove the liquid from the gap through the channel.

23. The apparatus of claim 22, wherein the removal of the liquid from the gap prevents the liquid from escaping radially outwardly of the gap.

24. The apparatus of claim 14, wherein the liquid containment member is disposed such that the liquid containment member surrounds the optical member of the projection system.

25. The apparatus of claim 24, wherein the liquid containment member is formed annularly.

26. The apparatus of claim 14, wherein the liquid containment member is disposed such that a distance between a bottom of the liquid containment member and the substrate is smaller than a distance between a bottom of the optical member and the substrate, when the substrate is under the optical member of the projection system.

27. The apparatus of claim 14, wherein the liquid containment member contains the liquid on an upper surface of the substrate during an exposure operation in which a portion of the upper surface of the substrate is covered with the liquid and another portion of the upper surface of the substrate is not covered with the liquid.

28. The apparatus of claim 14, wherein the stage has a stage surface which surrounds the substrate mounted on the stage.

29. The apparatus of claim 28, wherein the stage surface is at a same height as an upper surface of the substrate.

30. The apparatus of claim 28, wherein the stage moves to a position at which the substrate is lying partially within the liquid containment member and partially without the liquid containment member.

31. The apparatus of claim 28, wherein a groove exists between an edge of the substrate and the stage surface.

32. The apparatus of claim 28, wherein the stage surface is provided such that leakage of the liquid from a gap between an edge of the substrate and the stage surface is minimized.

33. The apparatus of claim 14, wherein the substrate includes a wafer.

34. A liquid immersion lithography method comprising:

moving a substrate below and relative to an optical member of a projection system and a liquid containment member;

exposing the substrate through a liquid which is confined on a portion of an upper surface of the substrate by the liquid containment member;

removing the liquid from a gap between the liquid containment member and the substrate through a channel of the liquid containment member; and

moving the liquid containment member by an actuator that is coupled to the liquid containment member.

35. The method of claim 34, wherein a height of the liquid containment member is adjusted by moving the liquid containment member by the actuator.

36. The method of claim 35, wherein the gap is maintained by adjusting the height of the liquid containment member by the actuator.

37. The method of claim 36, wherein a substrate height sensor is used to adjust the height of the liquid containment member by the actuator.

38. The method of claim 34, wherein the gap is maintained by moving the liquid containment member by the actuator.

39. The method of claim 38, wherein a substrate height sensor is used to adjust the height of the liquid containment member by the actuator.

40. The method of claim 34, wherein a substrate height sensor is used to move the liquid containment member by the actuator.

41. The method of claim 34, wherein the gap is controlled by moving the liquid containment member by the actuator.

42. The method of claim 34, wherein a vacuum is used in the channel of the liquid containment member to remove the liquid from the gap through the channel.

43. The method of claim 34, wherein the removal of the liquid from the gap prevents the liquid from escaping radially outwardly of the gap.

44. The method of claim 34, wherein a distance between a bottom of the liquid containment member and the substrate is smaller than a distance between a bottom of the optical member and the substrate.

45. The method of claim 34, wherein the liquid locally covers the portion of the upper surface of the substrate and another portion of the upper surface of the substrate is not covered with the liquid.