Method for making nanostructured surfaces
First Claim
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1. A continuous method for making a nanostructured surface comprising:
- (a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel,(b) introducing etchant gas to the vessel at a predetermined pressure,(c) generating plasma between the cylindrical electrode and a counter-electrode,(d) rotating the cylindrical electrode to translate the substrate, and(e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.
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Abstract
A continuous method for making a nanostructured surface comprises (a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.
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Citations
20 Claims
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1. A continuous method for making a nanostructured surface comprising:
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(a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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9. The method of 1 wherein the substrate comprises a microstructured surface.
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20. A continuous method for making a nanostructured surface comprising:
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(a) placing a substrate comprising a nanoscale dispersed phase on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching the dispersed phase to provide anisotropic nanoscale features on the surface.
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Specification