Re-emitting semiconductor construction with enhanced extraction efficiency

• US 8,461,568 B2
• Filed: 04/30/2010
• Issued: 06/11/2013
• Est. Priority Date: 05/05/2009
• Status: Expired due to Fees

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Yang, Zhaohui, Yi, Yasha, Leatherdale, Catherine A., Haase, Michael A., Smith, Terry L.
• Primary Examiner(s): YUSHIN, NIKOLAY K
• Application Number:
  US13/264,924
• Publication Number:
  US 20120074381A1
• Time in Patent Office: 1,138 Days
• Field of Search: 257/13, 257/98, 257/E33.008, 257/E33.073
• US Class Current: 257/13
• CPC Class Codes: H01L 25/167 comprising optoelectronic devices, e.g. LED, photodiodes
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: H01L 2933/0083 Periodic patterns for optical field-shaping in or on the semiconductor body or semiconductor body package, e.g. photonic bandgap structures
• CPC Class Codes: H01L 33/0087 with a substrate not being a II-VI compound
• CPC Class Codes: H01L 33/08 with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body H01L27/15 takes precedence
• CPC Class Codes: H01L 33/20 with a particular shape, e.g. curved or truncated substrate

Abstract

A stack of semiconductor layers forms a re-emitting semiconductor construction (RSC). The stack includes an active region that converts light at a first wavelength to light at a second wavelength, the active region including at least one potential well. The stack also includes an inactive region extending from an outer surface of the stack to the active region. Depressions are formed in the stack that extend from the outer surface into the inactive region. An average depression depth is at least 50% of a thickness of the inactive region or at least 50% of a nearest potential well distance. The depressions may have at least a 40% packing density in plan view. The depressions may also have a substantial portion of their projected surface area associated with obliquely inclined surfaces.

Claims

1. A device, comprising:

a stack of semiconductor layers, the stack including;

an active region adapted to convert light at a first wavelength λ

₁ to light at a second wavelength λ

₂, the active region including at least a first potential well; and

a first inactive region extending from an outer surface of the stack to the active region, a distance from the outer surface to the active region corresponding to a thickness of the first inactive region, the first inactive region characterized in that light at the first wavelength λ

₁ propagating therein is not substantially converted to other light;

wherein the stack also includes a plurality of depressions formed therein that extend from the outer surface into the first inactive region, the depressions being characterized by an average depression depth, and wherein the average depression depth is at least 50% of the thickness of the first inactive region, wherein the active region of the semiconductor layer stack also includes a first absorbing layer closely adjacent to, and having a band gap energy greater than a transition energy of the first potential well.

2. A multilayer semiconductor construction, comprising:

a stack of semiconductor layers configured to absorb light at a first wavelength and emit light at a longer second wavelength, the stack including;

a potential well;

a first semiconductor layer absorbing light at the first wavelength and having an index of refraction n₁; and

a second semiconductor layer having an index of refraction n₂ and comprising a plurality of extraction structures for extracting light from the stack at the second wavelength;

wherein n₂ is equal to or greater than n₁,

wherein the potential well and the first semiconductor layer are part of an active region of the stack in which light at the first wavelength is converted to light at the second wavelength, the stack also having an inactive region characterized in that light at the first wavelength propagating therein is not substantially converted to light, the inactive region including the second semiconductor layer and having an inactive region thickness; and

wherein the plurality of extraction structures comprise a plurality of depressions characterized by an average depression depth, and wherein the average depression depth is at least 50% of the inactive region thickness.

3. A device, comprising:

a stack of semiconductor layers, the stack including;

an active region adapted to convert light at a first wavelength λ

₁ to light at a second wavelength λ

₂, the active region including at least a first potential well; and

a first inactive region extending from an outer surface of the stack to the active region, the first inactive region characterized in that light at the first wavelength λ

₁ propagating therein is not substantially converted to other light;

wherein the first potential well is a nearest potential well to the outer surface of the stack and is characterized by a nearest potential well distance from the outer surface to the first potential well; and

wherein the stack also includes a plurality of depressions formed therein that extend from the outer surface into the first inactive region, the depressions being characterized by an average depression depth, and wherein the average depression depth is at least 50% of the nearest potential well distance.

4. The device of claim 3, wherein the depressions have nominally the same depth.

5. The device of claim 3, wherein the plurality of depressions have a packing density of at least 40%, the packing density being a percent area occupied by the plurality of depressions when the outer surface is shown in plan view.

6. The device of claim 3 in combination with an electroluminescent device configured to emit light at the first wavelength λ

₁.

7. The device of claim 3, wherein the average depression depth is at least 60% of the nearest potential well distance.

8. The device of claim 7, wherein the average depression depth is at least 70% of the nearest potential well distance.

9. The device of claim 8, wherein the average depression depth is at least 80% of the nearest potential well distance.

10. The device of claim 9, wherein the average depression depth is at least 90% of the nearest potential well distance.

11. The device of claim 3, wherein the depressions do not substantially extend into the active region.

12. The device of claim 3, wherein the stack extends in lateral directions generally parallel to a reference plane, and wherein each depression includes a surface that is inclined at an oblique angle to the reference plane.

13. The device of claim 12, wherein each depression has a projected area in plan view, and wherein at least 20% of the projected area corresponds to surfaces that are inclined at oblique angles.

14. The device of claim 13, wherein at least 20% of the projected area corresponds to surfaces that are inclined at oblique angles in a range from 10 degrees to 80 degrees.