Transistors, methods of manufacturing a transistor, and electronic devices including a transistor
First Claim
Patent Images
1. A transistor, comprising:
- a channel layer including an oxide semiconductor;
a source and a drain respectively contacting opposing ends of the channel layer;
a gate corresponding to the channel layer;
a gate insulating layer between the channel layer and the gate;
a first passivation layer covering the source, the drain, the gate, the gate insulating layer and the channel layer, wherein fluorine (F) is excluded from the first passivation layer; and
a second passivation layer including fluorine (F) on the first passivation layer, wherein the second passivation layer directly contacts all of the upper surface of the first passivation layer, and the first passivation layer is interposed between the second passivation layer and the source and the drain.
1 Assignment
0 Petitions
Accused Products
Abstract
Transistors, methods of manufacturing a transistor, and electronic devices including a transistor are provided, the transistor includes a channel layer, a source and a drain respectively contacting opposing ends of the channel layer, a gate corresponding to the channel layer, a gate insulating layer between the channel layer and the gate, and a first passivation layer and a second passivation layer sequentially disposed on the gate insulating layer. The first passivation layer covers the source, the drain, the gate, the gate insulating layer and the channel layer. The second passivation layer includes fluorine (F).
19 Citations
23 Claims
-
1. A transistor, comprising:
-
a channel layer including an oxide semiconductor; a source and a drain respectively contacting opposing ends of the channel layer; a gate corresponding to the channel layer; a gate insulating layer between the channel layer and the gate; a first passivation layer covering the source, the drain, the gate, the gate insulating layer and the channel layer, wherein fluorine (F) is excluded from the first passivation layer; and a second passivation layer including fluorine (F) on the first passivation layer, wherein the second passivation layer directly contacts all of the upper surface of the first passivation layer, and the first passivation layer is interposed between the second passivation layer and the source and the drain. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method of manufacturing a transistor, the method comprising:
-
forming a channel layer including an oxide semiconductor; forming source and drain respectively contacting opposing ends of the channel layer; forming a gate corresponding to the channel layer; forming a gate insulating layer between the channel layer and the gate; forming a first passivation layer that covers the source, the drain, the gate, the gate insulating layer and the channel layer, wherein fluorine (F) is excluded from the first passivation layer; and forming a second passivation layer containing fluorine (F) on the first passivation layer, wherein the second passivation layer directly contacts all of the upper surface of the first passivation layer, and the first passivation layer is interposed between the second passivation layer and the source and the drain. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23)
-
Specification