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Method for manufacturing indium tin oxide nanowires

  • US 8,465,691 B1
  • Filed: 05/26/2010
  • Issued: 06/18/2013
  • Est. Priority Date: 05/26/2010
  • Status: Active Grant
First Claim
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1. A method for manufacturing indium tin oxide nanowires with a resistivity of about 10

  • 3 Ω

    -cm, the method comprising;

    preparing a precursor aqueous solution comprising a tin-containing specie and an indium-containing specie wherein the molar ratio of the tin-containing specie to the indium-containing specie is about 5 to about 15%;

    preparing a polymer solution comprising an organic solvent;

    mixing the precursor solution with the polymer solution to produce an electrospinning solution or sol-gel wherein together the tin-containing specie and the indium-containing specie are from about 2% to about 15% by weight of the electrospinning solution or sol-gel;

    electrospinning the electrospinning solution or sol-gel at a relative humidity from about 15 to about 60 percent while irradiating the electrospinning solution or sol-gel with infrared radiation to provide the indium-tin nanowires with a cross-sectional thickness of from about 1 to about 100 micrometers;

    drying the indium tin oxide nanowires at a drying temperature of about 100°

    C. to about 200°

    C. to a moisture content of less than about 20% by weight;

    heating the indium tin oxide nanowires, at a rate between about 2 and about 20°

    C. per minute from the drying temperature to a calcination temperature of from about 700°

    C. to about 1000°

    C.; and

    maintaining the calcination temperature for a time from two hours to one week to provide indium tin oxide nanowires with a resistivity of about 10

    3
    Ω

    -cm.

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