Thermal conduction paths for semiconductor structures
First Claim
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1. A method comprising:
- forming an active device layer in a semiconductor wafer;
bonding a handle wafer to a top side of the semiconductor wafer; and
forming a thermal path in the semiconductor wafer, the thermal path being in contact with the active device layer.
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Abstract
A thermal path is formed in a layer transferred semiconductor structure. The layer transferred semiconductor structure has a semiconductor wafer and a handle wafer bonded to a top side of the semiconductor wafer. The semiconductor wafer has an active device layer formed therein. The thermal path is in contact with the active device layer within the semiconductor wafer. In some embodiments, the thermal path extends from the active device layer to a substrate layer of the handle wafer. In some embodiments, the thermal path extends from the active device layer to a back side external thermal contact below the active device layer.
22 Citations
16 Claims
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1. A method comprising:
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forming an active device layer in a semiconductor wafer; bonding a handle wafer to a top side of the semiconductor wafer; and forming a thermal path in the semiconductor wafer, the thermal path being in contact with the active device layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification