High frequency power supply

• US 8,466,622 B2
• Filed: 07/22/2008
• Issued: 06/18/2013
• Est. Priority Date: 07/23/2007
• Status: Expired due to Fees

• Current Assignee: Hüttinger Elektronik GmbH + Co. KG
• Original Assignee: Hüttinger Elektronik GmbH + Co. KG
• Inventors: Knaus, Hanns-Joachim
• Primary Examiner(s): Vu, Jimmy
• Assistant Examiner(s): LUONG, HENRY T
• Application Number:
  US12/177,809
• Publication Number:
  US 20090026964A1
• Time in Patent Office: 1,792 Days
• Field of Search: 31511101-11191, 324/403, 118/696, 118/699, 118/703, 118/705, 118/702, 118/682, 156/366, 156/345.28, 156/345.24, 361/84, 361/242
• US Class Current: 315/111.21
• CPC Class Codes: G01R 21/06 by measuring current and voltage G01R21/08 - G01R21/133 take precedence
• CPC Class Codes: G01R 23/02 Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
• CPC Class Codes: H01J 37/32045 Circuits specially adapted for controlling the glow discharge
• CPC Class Codes: H02M 7/003 Constructional details, e.g. physical layout, assembly, wiring or busbar connections
• CPC Class Codes: H02M 7/5383 in a self-oscillating arrangement H02M7/538 takes precedence
• CPC Class Codes: H03H 7/40 Automatic matching of load impedance to source impedance
• CPC Class Codes: H05B 41/2806 with semiconductor devices and specially adapted for lamps without electrodes in the vessel, e.g. surface discharge lamps, electrodeless discharge lamps
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: Y02B 20/00 Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps

Abstract

For determining a wave running time between a RF source in a plasma power supply device and a load connected to the plasma power supply device, an RF pulse is transmitted forwards from the RF source to the load. The pulses are reflected by the load and transmitted backwards to the power source. A return time measured on arrival of the pulse(s) at the inverter is used to determine a wave running time.

Claims

1. A method performed by a plasma power supply device for determining a wave running time between the plasma power supply device and a load connected to the plasma power supply device, the method comprising:

transmitting at least one RF pulse forward from the plasma power supply device to the load;

starting a time measurement at a start time that relates to the transmittal of the at least one RF pulse;

measuring a return time on arrival of the pulse reflected by the load and transmitted backward to the plasma power supply device; and

determining the wave running time based on the start time and the return time.

2. The method of claim 1, wherein the plasma power supply device includes at least one inverter with a switching element, and the start time is the time at which the switching element is switched to generate the at least one RF pulse.

3. The method of claim 1, wherein the plasma power supply device includes at least one inverter and a time measurement device between the at least one inverter and the load, and the start time is the time at which the at least one RF pulse passes by the time measurement device.

4. The method of claim 1, wherein the wave running time is determined from a sequence of a plurality of RF pulses transmitted consecutively to the load and reflected by the load.

5. The method of claim 1, wherein the wave running time is determined from at least one of a plurality of individual RF pulses and sequences of RF pulses transmitted consecutively to the load and reflected by the load.

6. The method of claim 5, wherein at least one of the RF pulses or the sequences of RF pulses are increased in power, starting with low power values.

7. The method of claim 1, further comprising supplying proper power to the load by the plasma power supply device, wherein the return time measurement takes place before the supplying proper power to the load.

8. The method of claim 1, further comprising after measuring the return time of the pulse reflected by the load, discharging the pulse reflected by the load into an absorptive component.

9. The method of claim 1, further comprising adjusting an operating parameter of the plasma power supply device based on the wave running time.

10. The method of claim 9, wherein the operating parameter is a time interval during which the plasma power supply device is disconnected from the load.

11. The method of claim 1, further comprising adjusting a matching parameter, the matching parameter affecting an impedance matching of the load to the plasma power supply device.

12. The method of claim 1, further comprising storing at least one of the start time, the return time, and the wave running time.

13. A plasma power supply device for generating an output power greater than 500 W at an essentially constant basic frequency of at least 3 MHz and for powering a load to which the output power is supplied and from which reflected power is returned to the plasma power supply device, at least in the event of an impedance mismatch between the plasma power supply device and the load, the load including an impedance of the plasma process in operation, the plasma power supply device comprising:

an RF source configured for supplying the output power and for supplying a measurement signal to the load;

a control system for activating the RF source; and

a time measurement device between the RF source and the load for measuring a return time of the measurement signal being reflected from the load,

wherein the control system is configured to;

activate an inverter for supplying the measurement signal,

start a time measurement of the time measurement device at a start time that relates to the activation of the inverter for supplying the measurement signal,

end the time measurement at a return time, when the measurement signal returns to the time measurement device, and

derive a wave running time of the measurement signal between the plasma power supply device based on the start time and the return time.

14. The plasma power supply device of claim 13, wherein the measurement device is further configured to measure a passing time of the measurement signal when traveling towards the load, and the control system is further configured to use the passing time as the start time.

15. The plasma power supply device of claim 13, wherein the control system is further configured to use the time of activation of the RF source as the start time.

16. The plasma power supply device of claim 13, further comprising a memory for storing at least one of the start time, the return time, and the wave running time.

17. The plasma power supply device of claim 13, wherein the power source includes at least one switching element that includes a MOSFET.

18. The plasma power supply device of claim 13, wherein the RF source includes at least two switching elements in a half bridge arrangement.

19. The plasma power supply device of claim 13, wherein the RF source includes at least four switching elements in a full bridge arrangement.

20. The plasma power supply device of claim 13, wherein the RF source includes an inverter that is one of a class D amplifier and a class E amplifier.

21. The plasma power supply device of claim 13, further including at least one absorptive component, which is configured to at least partially absorb power reflected from the plasma process.

22. The plasma power supply device of claim 13, wherein the RF source comprises at least a first power supply module and a second power supply module, each power supply module including at least one inverter with at least one switching element, a power coupler with at least a first input port, a second input port, a first output port, and second output port,

wherein the first and second power supply modules are coupled to the first input port and the second input port of the power coupler for supplying a first input signal and a second input signal, respectively, the first input signal and the second input signal having a phase relationship, the first output port is coupled to the load, and the power coupler is configured to combine the first input signal and the second input signal in a combined signal, which is provided in dependence of the phase relationship to at least one of the first output port and the second output port.

23. The plasma power supply device of claim 22, wherein at least one absorptive component is connected to the second output port of the power coupler.

24. The plasma power supply device of claim 23, wherein the at least one absorptive component is a resistor.

25. The plasma power supply device of claim 22, wherein the at least one power coupler is a 90°

hybrid.

26. The plasma power supply device of claim 13, wherein the wave running time is a time interval during which the measurement signal travels from the time measurement device to the load and back.

27. The plasma power supply device of claim 13, wherein the RF source includes a switching element, and the wave running time is a time interval during which the measurement signals travels from the switching element to the load and back to the time measurement device.