Process for manufacturing EMI filters utilizing counter-bored capacitors to facilitate solder re-flow

• US 8,468,664 B2
• Filed: 05/07/2009
• Issued: 06/25/2013
• Est. Priority Date: 05/22/2008
• Status: Active Grant

• Current Assignee: Greatbatch Limited (Greatbatch Incorporated)
• Original Assignee: Greatbatch Limited (Greatbatch Incorporated)
• Inventors: Brendel, Richard L., Woods, Jason, Lorente-Adame, Jose Luis, Stevenson, Robert A., Roberts, John, Truex, Buehl E.
• Primary Examiner(s): TRINH, MINH N
• Application Number:
  US12/437,345
• Publication Number:
  US 20090288280A1
• Time in Patent Office: 1,510 Days
• Field of Search: 29 2535- 2542, 29830-831, 298/32, 295/921, 361/302, 361/307, 361/306.2, 607/5, 333182-185
• US Class Current: 29/25.42
• CPC Class Codes: A61N 1/3754 Feedthroughs
• CPC Class Codes: H01G 4/228 Terminals
• CPC Class Codes: H01G 4/35 Feed-through capacitors or anti-noise capacitors
• CPC Class Codes: H01G 4/40 Structural combinations of fixed capacitors with other electric elements, the structure mainly consisting of a capacitor, e.g. RC combinations
• CPC Class Codes: H01G 5/00 Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
• CPC Class Codes: H01G 5/01 Details
• CPC Class Codes: H01G 5/011 Electrodes
• CPC Class Codes: Y10T 29/43 Electric condenser making
• CPC Class Codes: Y10T 29/435 Solid dielectric type
• CPC Class Codes: Y10T 29/49002 Electrical device making

Abstract

An EMI filtered terminal assembly including at least one conductive terminal pin, a feedthrough capacitor, and a counter-bore associated with a passageway through the capacitor is described. Preferably, the feedthrough capacitor having counter-drilled or counter-bored holes on its top side is first bonded to a hermetic insulator. The counter-drilled or counter-bore holes in the capacitor provide greater volume for the electro-mechanical attachment between the capacitor and the terminal pin or lead wire, permitting robotic dispensing of, for example, thermal-setting conductive adhesive.

Claims

1. A process for manufacturing an electromagnetic interference (EMI) filter for use in an active implantable medical device (AIMD), comprising the steps of:

a) providing a capacitor comprising a thickness extending alone a longitudinal axis between spaced apart first and second capacitor surfaces meeting a capacitor outer sidewall, wherein the capacitor is comprised of a dielectric material having interleaved, but spaced apart active and ground electrode plates therein, and at least one through hole having a first diameter perpendicular to the longitudinal axis thereof;

b) forming a well comprising a well sidewall having a continuous semi-circular shape in cross-section along an imaginary plane aligned with the longitudinal axis of the through hole, the well sidewall extending from a second diameter at the one of the first and second capacitor surfaces part-way into the thickness of the capacitor to the through hole, wherein the second diameter is greater than the first diameter of the through hole;

c) inserting a pin or a lead wire at least partially into the well and the through hole;

d) placing an electrically conductive material in the well, wherein the electrically conductive material comprises a liquid or semi-liquid material during at least a portion of the manufacturing process; and

e) utilizing the electrically conductive material to conductively couple the pin or the lead wire to one of the active or ground electrode plates.

2. The process of claim 1, including selecting the electrically conductive material from the group consisting of a thermal-setting conductive adhesive, a solder, a solder preform, a solder paste, and a brazed preform.

3. The process of claim 2 the step of placing the electrically conductive material in the well includes dispensing the electrically conductive material into the well by means of a hand held syringe, a robotic syringe, robotic placement of a solder preform or hand placement of a solder preform.

4. The process of claim 1 including providing the through hole comprising a conductive termination surface conductively coupled to one of the active or ground electrode plates.

5. The of claim 4 including providing the well comprising a termination surface extending contiguously from the through hole conductive termination surface.

6. The process of claim 1 including providing the well comprising a conductive termination surface.

7. The process of claim 1 including providing the electrically conductive material conductively coupling the pin or the lead wire to one of the active or ground electrode plates directly and without an intervening conductive termination surface for the electrode plates.

8. The process of claim 7 including providing shrinkage of the dielectric material of the capacitor being greater than shrinkage of the electrode plates such that a protruding end of the electrode plates, conductively coupled to the electrically conductive material, extends inwardly from the dielectric material into the through hole.

9. The process of claim 7, including acid-etching the dielectric material adjoining the through hole prior to utilizing the electrically conductive material to conductively couple the pin or the lead wire to one of the active or ground electrode plates.

10. The process of claim 1, including the step of causing at least a portion of the electrically conductive material to flow from the well into the through hole between the capacitor and the pin or the lead wire.

11. The process of claim 10, including the step of centrifuging the electrically conductive material into the through hole.

12. The process of claim 1 including providing the capacitor comprising a plurality of through holes and a corresponding plurality of wells that are physically and electrically isolated from one another.

13. The process of claim 1 including forming the well in the surface of the capacitor when the dielectric material is in a green state.

14. The process of claim 13, including the steps of:

a) forming a laminate structure of the active and ground electrode plates and green dielectric material of a size to create a plurality of capacitors;

b) forming the through holes for each capacitor in the laminate structure;

c) forming a well in connection with each of the through holes;

d) cutting or punching the capacitors from the laminate structure; and

e) curing the capacitors.

15. The process of claim 13 including pressing or cutting the well into the green ceramic material.

16. The process of claim 13 including first drilling the through hole followed by forming the well by drilling a larger diameter semi-circular counterbore at one of the first and second capacitor surfaces.

17. The process of claim 16 including simultaneously forming the through hole and the well using a single drilling/boring operation.

18. The process of claim 1, including the step of inserting a non-conductive material into the well and over the electrically conductive material.

19. The process of claim 1 including inserting a sufficient quantity of an electrically conductive material into the well so that space between the capacitor and the lead wire or the pin is at least partially filled with the electrically conductive material in both the well and the through hole.

20. The process of claim 1, including the step of placing a bonding washer between the capacitor and a capacitor mounting surface.

21. The process of claim 20 including providing the bonding washer having an open-ended notch configured to receive the pin or lead wire therethrough, thereby forming a path for gas to escape from the through hole as the electrically conductive material flows therein.

22. The process of claim 20, including the step of placing a plurality of bonding washers between the capacitor and the mounting surface, the bonding washers having apertures that cooperatively form a gas escape path from the through hole as electrically conductive material, flows therein.

23. The process of claim 1 including providing the active and ground electrode plates being only disposed laterally of the through hole, but not the well.

24. A process for manufacturing an electromagnetic interference (EMI) filter for use in an active implantable medical device (AIMD), comprising the steps of:

a) providing a capacitor comprising a thickness extending along a longitudinal axis between spaced apart first and second capacitor surfaces meeting a capacitor outer sidewall, wherein the capacitor is comprised of a dielectric material having interleaved, but spaced apart active and ground electrode plates therein, and at least one through hole having a first diameter perpendicular to the longitudinal axis thereof;

b) forming a well comprising a well sidewall having a continuous semi-circular shape in cross-section along an imaginary plane aligned with the longitudinal axis of the through hole in the capacitor to thereby provide a second diameter greater than the first diameter of the through hole extending from one of the first and second capacitor surfaces part way into the thickness of the capacitor where the well meets the through hole;

c) inserting a pin or a lead wire at least partially into the well and the through hole;

d) placing an electrically conductive material in the well, wherein the electrically conductive material comprises a liquid or semi-liquid material during at least a portion of the manufacturing process; and

e) utilizing the electrically conductive material to directly conductively couple the pin or the lead wire to one of the active or ground electrode plates without an intervening conductive termination surface for the electrode plates.

25. The process of claim 24 including providing shrinkage of the dielectric material of the capacitor being greater than shrinkage of the electrode plates such that a protruding end of the electrode plates, conductively coupled to the electrically conductive material, extends inwardly from the dielectric material into the through hole.

26. The process of claim 24, including the step of acid-etching the dielectric material adjoining the through hole prior to the step of utilizing the electrically conductive material to conductively couple the pin or the lead wire to one of the active or ground electrode plates.

27. The process of claim 24 including providing the active and ground electrode plates being only disposed laterally of the through hole, but not the well.

28. A process for manufacturing an electromagnetic interference (EMI) filter for use in an active implantable medical device (AIMD), comprising the steps of:

a) providing a capacitor comprised of a dielectric material having active and ground electrode plates therein, and at least one through hole;

b) forming a well in a surface of the capacitor at one end of the through hole;

c) inserting a pin or a lead wire at least partially into the through hole;

d) placing a bonding washer against a mounting surface of the capacitor, wherein the bonding washer has an aperture configured to receive the pin or lead wire therethrough;

e) placing an electrically conductive material in the well, wherein the electrically conductive material comprises a liquid or semi-liquid material during at least a portion of the manufacturing process;

f) utilizing the electrically conductive material to conductively couple the pin or the lead wire to one of the active or ground electrode plates; and

g) wherein the aperture of the bonding washer forms a path for gas to escape from the through hole as the electrically conductive material flows therein.

29. The process of claim 28 including providing the aperture as an open-ended notch.

30. A process for manufacturing an electromagnetic interference (EMI) filter for use in an active implantable medical device (AIMD), comprising the steps of:

a) providing a capacitor comprising a thickness extending along a longitudinal axis between spaced apart first and second capacitor surfaces meeting a capacitor outer sidewall, wherein the capacitor is comprised of a dielectric material having interleaved, but spaced apart active and ground electrode plates therein, and at least one through hole having a first diameter perpendicular to the longitudinal axis thereof;

b) forming a well comprising a well sidewall having an elliptical shape in cross-section along an imaginary plane aligned with the longitudinal axis of the through hole, the well sidewall extending from a second diameter at the one of the first and second capacitor surfaces part-way into the thickness of the capacitor to the through hole, wherein the elliptical cross-section of the well sidewall along the longitudinal axis is continuous from the second diameter being greater than the first diameter;

c) inserting a pin or a lead wire at least partially into the well and the through hole;

d) placing an electrically conductive material in the well, wherein the electrically conductive material comprises a liquid or semi-liquid material during at least a portion of the manufacturing process; and

e) utilizing the electrically conductive material to conductively couple the pin or the lead wire to one of the active or ground electrode plates.