Lithographic apparatus and device manufacturing method

• US 8,472,002 B2
• Filed: 02/02/2010
• Issued: 06/25/2013
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Bijlaart, Erik Theodorus Maria, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Kolesnychenko, Aleksey, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Streefkerk, Bob, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/698,938
• Publication Number:
  US 20110001942A1
• Time in Patent Office: 1,239 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 250/548, 250/492.2, 359/380
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

a suction port, positioned to provide suction to a gap between the edge seal member and the substrate, the object, or both, and at a side of the gap opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

2. The apparatus according to claim 1, wherein the substrate table further comprises a channel positioned radially inwardly of the suction port, the channel being connected to a gas source such that on actuation of the suction a flow of gas radially outwardly from the channel towards the suction can be established.

3. The apparatus according to claim 2, wherein one or more burls configured to be in contact with the substrate, the object, or both, are present radially outwardly of the channel and inwardly of the suction port.

4. The apparatus according to claim 1, wherein the substrate table comprises a portion which extends below the substrate, the object, or both, and is radially outwardly of the suction port.

5. The apparatus according to claim 4, wherein the portion has one or more parts which extend up to the substrate, the object, or both, to at least partly support the substrate, the object, or both.

6. The apparatus according to claim 4, wherein the portion is part of a pimple table which supports the substrate.

7. The apparatus according to claim 1, further comprising a compartment in the substrate table in fluid connection with the gap via the suction port and with the suction.

8. The apparatus according to claim 1, wherein the suction port is annular.

9. The apparatus according to claim 1, wherein the suction port is discontinuous.

10. The apparatus according to claim 1, wherein the suction port is continuous.

11. The apparatus according to claim 1, wherein the suction port is positioned adjacent an edge portion of the edge seal member.

12. The apparatus according to claim 1, wherein the object comprises a sensor.

13. The apparatus according to claim 1, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

14. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

an outlet positioned underneath a gap between the edge seal member and the substrate, the object, or both, to remove liquid entering the gap; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the table, the liquid supply system comprising a liquid confinement structure positioned adjacent a final surface of the projection system and extending along at least a part of a boundary of the space, wherein, when the liquid is in the space, the cross-sectional area of the liquid in the space is smaller than the area of the substrate.

15. The apparatus according to claim 14, wherein the table further comprises a channel positioned radially inwardly of the outlet such that after actuation of suction at the outlet there is a flow of gas radially outwardly from the channel towards the outlet.

16. The apparatus according to claim 15, wherein one or more burls configured to be in contact with the substrate, the object, or both, are present radially outwardly of the channel and inwardly of the outlet.

17. The apparatus according to claim 14, wherein the table comprises a portion which extends below the substrate, the object, or both, and is radially outwardly of the outlet.

18. The apparatus according to claim 17, wherein the portion has one or more parts which extend up to the substrate, the object, or both, to at least partly support the substrate, the object, or both.

19. The apparatus according to claim 17, wherein the portion is part of a pimple table which supports the substrate.

20. The apparatus according to claim 14, further comprising a compartment in the table in fluid connection with the gap via the outlet.

21. The apparatus according to claim 14, wherein the outlet is annular.

22. The apparatus according to claim 14, wherein the outlet is discontinuous.

23. The apparatus according to claim 14, wherein the outlet is continuous.

24. The apparatus according to claim 14, wherein the outlet is positioned adjacent an edge portion of the edge seal member.

25. The apparatus according to claim 14, wherein the object comprises a sensor.

26. The apparatus according to claim 14, wherein the edge seal member is separable from the substrate table and movable relative to the substrate, the object, or both.

27. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

a liquid supply port positioned to provide liquid to a gap between the edge seal member and the substrate, the object, or both, and at a side of the gap opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

28. The apparatus of claim 27, wherein the liquid supply system comprises a liquid confinement structure positioned adjacent a final surface of the projection system and extending along at least a part of a boundary of the space, wherein, when the liquid is in the space, the cross-sectional area of the liquid in the space is smaller than the area of the substrate.