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Apparatus for etching high aspect ratio features

  • US 8,475,625 B2
  • Filed: 05/03/2006
  • Issued: 07/02/2013
  • Est. Priority Date: 05/03/2006
  • Status: Expired due to Fees
First Claim
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1. A processing chamber comprising:

  • a chamber body assembly having an interior volume;

    a showerhead assembly coupled to a ceiling of the chamber body and having at least two fluidly isolated plenums formed therein, a region transmissive to an optical metrology signal defined through a ceramic plug, a first plurality of gas passages formed through the showerhead assembly fluidly coupling a first plenum of the at least two fluidly isolated plenums to the interior volume of the chamber body, wherein the first gas passages are distributed at a plurality radial distances from a center of the showerhead assembly, and a second plurality of gas passages formed through the showerhead assembly fluidly coupling a second plenum of the at least two fluidly isolated plenums to the interior volume of the chamber body, wherein the second gas passages are distributed at a plurality radial distances from the center of the showerhead assembly, wherein the showerhead assembly further includes a gas distribution plate facing the substrate support assembly fabricated from bulk Yttrium, the gas distribution plate having a plurality of apertures aligned with a plurality of apertures formed in the ceramic plug; and

    a substrate support assembly disposed in the chamber body.

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