Through-silicon vias and methods for forming the same
First Claim
Patent Images
1. An integrated circuit structure comprising:
- a substrate;
a through-silicon via (TSV) formed of a conductive material extending into the substrate;
a TSV pad spaced apart from the TSV, wherein the TSV pad is adjacent the TSV and on a first side, and not on a second side, of the TSV, wherein the first and the second sides are opposite to each other relative to an axis of the TSV, and are on a same side of the substrate, and wherein the axis is perpendicular to a major surface of the substrate; and
a metal line over, and electrically connecting, the TSV and the TSV pad.
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Abstract
An integrated circuit structure and methods for forming the same are provided. The integrated circuit structure includes a substrate; a through-silicon via (TSV) extending into the substrate; a TSV pad spaced apart from the TSV; and a metal line over, and electrically connecting, the TSV and the TSV pad.
89 Citations
27 Claims
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1. An integrated circuit structure comprising:
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a substrate; a through-silicon via (TSV) formed of a conductive material extending into the substrate; a TSV pad spaced apart from the TSV, wherein the TSV pad is adjacent the TSV and on a first side, and not on a second side, of the TSV, wherein the first and the second sides are opposite to each other relative to an axis of the TSV, and are on a same side of the substrate, and wherein the axis is perpendicular to a major surface of the substrate; and a metal line over, and electrically connecting, the TSV and the TSV pad. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 26)
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9. An integrated circuit structure comprising:
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a semiconductor substrate; a plurality of dielectric layers over the semiconductor substrate; a through-silicon via (TSV) penetrating the plurality of dielectric layers and the semiconductor substrate, wherein the TSV is formed of a conductive material and extends to a back surface of the semiconductor substrate; a TSV pad directly over the plurality of dielectric layers, wherein the TSV pad is adjacent the TSV and on a first side, and not on a second side, of the TSV, wherein the first and the second sides are opposite to each other relative to an axis of the TSV, and are on a same side of the semiconductor substrate, and wherein the axis is perpendicular to a major surface of the semiconductor substrate; and a metal line overlying and electrically connecting the TSV pad and the TSV. - View Dependent Claims (10, 11, 12, 13, 14, 15, 27)
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16. A method of forming an integrated circuit structure, the method comprising:
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providing a wafer comprising; a semiconductor substrate; and a through-silicon via (TSV) pad over the semiconductor substrate; forming a TSV opening extending from a top surface of the wafer into the semiconductor substrate, wherein the TSV pad is adjacent the TSV opening, and wherein the TSV opening does not extend through the TSV pad; forming a TSV in the TSV opening; and forming a metal line electrically connecting the TSV and the TSV pad. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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23. A method of forming an integrated circuit structure, the method comprising:
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providing a wafer comprising; a semiconductor substrate; and a through-silicon via (TSV) pad over the semiconductor substrate; forming a TSV opening extending into the semiconductor substrate and adjacent the TSV pad, wherein the TSV pad is on a first side, and not on a second side, of the TSV opening, wherein the first and the second sides are opposite to each other relative to an axis of the TSV opening, and are on a same side of the semiconductor substrate, and wherein the axis is perpendicular to a major surface of the semiconductor substrate; blanket forming a diffusion barrier layer over the wafer, wherein the diffusion barrier layer extends into the TSV opening; blanket forming a copper seed layer on the diffusion barrier layer; forming and patterning a mask layer, wherein the TSV pad, the TSV opening, and a region therebetween are exposed through the mask layer; selectively forming a copper layer on the copper seed layer, wherein the copper layer fills the TSV opening to form a TSV, and wherein the copper layer extends over the TSV pad; removing the mask layer to expose portions of the copper seed layer and the diffusion barrier layer underlying the mask layer; etching the exposed portions of the copper seed layer; and etching the exposed portions of the diffusion barrier layer. - View Dependent Claims (24, 25)
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Specification