Donor film for laser induced thermal imaging method, light emitting device using the same, and method of manufacturing light emitting device

• US 8,480,448 B2
• Filed: 09/24/2010
• Issued: 07/09/2013
• Est. Priority Date: 09/08/2005
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Yang, Nam-Choul, Duan, Lian, Kim, Mu-Hyun, Lee, Seong-Taek
• Primary Examiner(s): Patel, Ashok
• Application Number:
  US12/890,226
• Publication Number:
  US 20110014729A1
• Time in Patent Office: 1,019 Days
• Field of Search: None
• US Class Current: 445/23
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/18 using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
• CPC Class Codes: H10K 71/421 using coherent electromagnetic radiation, e.g. laser annealing
• CPC Class Codes: Y10T 428/24479 including variation in thickness

Abstract

A donor film for a laser induced thermal imaging method capable of improving the optical efficiency of an emission layer, a light emitting device using the same, and a method of manufacturing the light emitting device are provided. The donor film for a laser induced thermal imaging method includes a base substrate, a light to heat conversion layer (LTHC) provided on the base substrate and having a pattern with a predetermined step difference, and a transfer layer provided on the LTHC. It is possible to improve the optical efficiency of the emission layer by patterning the transfer layer using the LTHC having the pattern with a predetermined step difference.

Claims

1. A method of manufacturing a light emitting device, the method comprising the steps of:

providing an acceptor substrate;

providing a donor film separated from said acceptor substrate by a predetermined distance and comprising a light to heat conversion layer including a transcription pattern with a predetermined step difference on a base substrate and a transfer layer provided on said light to heat conversion layer including the transcription pattern;

arranging said donor film so that said transfer layer faces the surface of said acceptor substrate; and

radiating a laser onto said donor film to transcribe the transfer layer onto said acceptor substrate.

2. The method as claimed in claim 1, before the step of transcribing said transfer layer, further comprising forming a first electrode on the acceptor substrate.

3. The method as claimed in claim 2, further comprising:

forming an active layer on said first electrode; and

forming a second electrode on said active layer.

4. The method as claimed in claim 1, after the step of transcribing said transfer layer on the acceptor substrate, further comprising forming a first electrode on said transfer layer.

5. The method as claimed in claim 4, further comprising:

forming an active layer on said first electrode; and

forming a second electrode on said active layer.

6. The method as claimed in claim 1, wherein the step of transcribing said transfer layer includes transcribing protruding parts of said transfer layer first.

7. The method as claimed in claim 6, wherein said pattern is a concavo-convex pattern or an embossed pattern.