Processing system

• US 8,480,847 B2
• Filed: 01/28/2008
• Issued: 07/09/2013
• Est. Priority Date: 02/01/2007
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Amano, Yoshifumi
• Primary Examiner(s): Yuan, Dah-Wei
• Assistant Examiner(s): KITT, STEPHEN A
• Application Number:
  US12/309,974
• Publication Number:
  US 20100000682A1
• Time in Patent Office: 1,989 Days
• Field of Search: 156/345.29
• US Class Current: 156/345.29
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/67178 vertical arrangement
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

A processing system adapted for processing an object to be processed, including a processing vessel configured for containing the object to be processed and for receiving a processing fluid, a processing fluid generating unit configured for generating a processing fluid, a processing-side fluid passage configured for supplying the processing fluid into the processing vessel, and a discharge fluid passage configured for discharging the processing fluid from the processing vessel. The processing system further includes a bypass-side fluid passage configured for discharging the processing fluid generated in the processing fluid generating unit without passing it through the processing vessel, a pressure control mechanism provided to the discharge fluid passage downstream from a position at which the bypass-side fluid passage is connected with the discharge fluid passage, and a switch valve configured to selectively switch a fluid passage of the processing fluid between the processing-side fluid passage and the bypass-side fluid passage.

Claims

1. A processing system comprising:

a processing vessel configured to contain an object to be processed;

a processing fluid generating unit configured to generate a processing fluid;

a processing-side fluid passage configured for supplying the processing fluid generated in the processing fluid generating unit into the processing vessel;

a discharge fluid passage configured for discharging the processing fluid from the processing vessel;

a bypass-side fluid passage connected with the discharge fluid passage at its downstream end and connected with the processing-side fluid passage at its upstream end, and configured for discharging the processing fluid generated in the processing fluid generating unit without passing said processing fluid through the processing vessel;

a pressure control mechanism provided to the discharge fluid passage downstream from a position at which the downstream end of the bypass-side fluid passage is connected with the discharge fluid passage;

a switch valve configured to selectively switch a fluid passage, into which the processing fluid generated in the processing fluid generating unit is fed, between the processing-side fluid passage and the bypass-side fluid passage;

a purging gas supply fluid passage configured for supplying a purging gas into the processing vessel, a downstream end of the purging gas supply fluid passage being connected with the processing-side fluid passage downstream from the switch valve;

a purging gas discharge fluid passage configured for discharging the purging gas from the processing vessel, an upstream end of the purging gas discharge fluid passage being connected with the discharge fluid passage upstream from the position at which the downstream end of the bypass-side fluid passage is connected with the discharge fluid passage;

an on-off valve provided to the purging gas supply fluid passage and configured for controlling a supply of the purging gas; and

a discharge switch valve provided at a position at which the purging gas discharge fluid passage is connected to the discharge fluid passage, and configured to make the processing fluid flow in the discharge fluid passage through the discharge switch valve and to make the purging gas flow from the discharge fluid passage into the purging gas discharge fluid passage,

wherein the on-off valve, the switch valve, and the discharge switch valve are controlled such that;

when the purging gas flows into the processing vessel from the purging gas supply fluid passage through the on-off valve, the processing fluid generated in the processing fluid generating unit is fed into the bypass-side fluid passage through the switch valve and then discharged from the discharge fluid passage after passing through the pressure control mechanism, while the purging gas discharged from the processing vessel is fed into the purging gas discharge fluid passage through the discharge switch valve and then exhausted from the purging gas discharge fluid passage; and

when the processing fluid generated in the processing fluid generating unit flows into the processing vessel and the object to be processed is processed, the processing fluid fed into the processing vessel is discharged from the discharge fluid passage after passing through the pressure control mechanism, while the purging gas is prevented from flowing into the processing vessel by the on-off valve;

when the purging gas flows into the processing vessel from the purging gas supply fluid passage through the on-off valve, the purging gas discharged from the processing vessel and fed into the purging gas discharge fluid passage through the discharge switch valve is prevented from flowing through the pressure control mechanism.

2. The processing system according to claim 1,

wherein the purging gas is an inert gas.

3. The processing system according to claim 1,

wherein the processing fluid is an ozone gas.

4. The processing system according to claim 1, further comprising:

a second processing fluid generating unit configured to generate a second processing fluid different from the processing fluid;

a second processing-side fluid passage configured for supplying the second processing fluid generated in the second processing fluid generating unit into the processing vessel;

a second bypass-side fluid passage configured for discharging the second processing fluid generated in the second processing fluid generating unit without passing said second processing fluid through the processing vessel; and

a second switch valve configured to selectively switch a fluid passage, into which the second processing fluid generated in the second processing fluid generating unit is fed, between the second processing-side fluid passage and the second bypass-side fluid passage,

wherein a downstream end of the second bypass-side fluid passage is connected with the discharge fluid passage upstream from the pressure control mechanism.

5. The processing system according to claim 4,

wherein the second processing fluid is water vapor.

6. The processing system according to claim 1,

wherein the processing vessel includes a plurality of processing vessels,

wherein the processing-side fluid passage includes a plurality of processing-side fluid passages, each processing-side fluid passage being provided separately, for each processing vessel,

wherein the discharge fluid passage includes a plurality of discharge fluid passages, each discharge fluid passage being provided separately, for each processing vessel,

wherein the bypass-side fluid passage includes a plurality of bypass-side fluid passages, each bypass-side fluid passage being provided separately, for each processing vessel,

wherein the pressure control mechanism includes a plurality of pressure control mechanisms, each pressure control mechanism being provided individually, for each discharge fluid passage,

wherein a downstream end of each bypass-side fluid passage is connected with each corresponding discharge fluid passage upstream from each corresponding pressure control mechanism, and

wherein the processing fluid generated in the processing fluid generating unit is selectively fed into each corresponding processing-side fluid passage and each corresponding bypass-side fluid passage.

7. The processing system according to claim 1, wherein

when the purging gas flows into the processing vessel from the purging gas supply fluid passage through the on-off valve, the processing fluid generated in the processing fluid generating unit and fed into the bypass-side fluid passage through the switch valve is then exhausted from the discharge fluid passage after passing through the pressure control mechanism;

and

when the processing fluid generated in the processing fluid generating unit flows into the processing vessel and the object to be processed is processed, the processing fluid fed into the processing vessel is exhausted from the discharge fluid passage after passing through the pressure control mechanism.