Quaternary chalcogenide wafers
First Claim
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1. A non-vacuum based process for making a quaternary chalcogenide wafer comprising:
- a. milling quaternary chalcogenide crystals to form milled particles with a particle size, d90 in the range of 0.1 micron to 10 microns, wherein the quaternary chalcogenide crystals are selected from the group consisting of Cu2ZnSnS4 (CZTS);
Cu2ZnSn(Sa,Se1-a)4, where 0≦
a≦
1 (CZTS/Se); and
Cu2ZnSnSe4 (CZTSe);
b. compressing the milled particles at a temperature in the range of room temperature to 250°
C. to form a quaternary chalcogenide wafer having a thickness in the range of 10 microns to 300 microns.
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Abstract
Disclosed herein are processes for making quaternary chalcogenide wafers. The process comprises milling quaternary chalcogenide crystals to form milled particles, and then compressing the milled particles to form a quaternary chalcogenide wafer. The quaternary chalcogenide wafers are useful for forming solar cells.
6 Citations
7 Claims
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1. A non-vacuum based process for making a quaternary chalcogenide wafer comprising:
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a. milling quaternary chalcogenide crystals to form milled particles with a particle size, d90 in the range of 0.1 micron to 10 microns, wherein the quaternary chalcogenide crystals are selected from the group consisting of Cu2ZnSnS4 (CZTS);
Cu2ZnSn(Sa,Se1-a)4, where 0≦
a≦
1 (CZTS/Se); and
Cu2ZnSnSe4 (CZTSe);b. compressing the milled particles at a temperature in the range of room temperature to 250°
C. to form a quaternary chalcogenide wafer having a thickness in the range of 10 microns to 300 microns. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification