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Exposure apparatus, exposure method, and method for producing device

  • US 8,482,716 B2
  • Filed: 06/09/2005
  • Issued: 07/09/2013
  • Est. Priority Date: 06/10/2004
  • Status: Expired due to Fees
First Claim
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

  • a projection optical system; and

    a liquid immersion device which supplies the liquid and which recovers the liquid, wherein;

    the liquid immersion device has an inclined surface which is facing a surface of the substrate and which is inclined with respect to a surface perpendicular to an optical axis of the projection optical system;

    the inclined surface of the liquid immersion device is arranged such that a surface of the substrate is facing the inclined surface during exposure;

    the inclined surface is inclined upwardly and radially outwardly with respect to the optical axis;

    the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated; and

    the liquid immersion device has a recovery port, which is formed on a face of the inclined surface and which recovers the liquid on the substrate during the exposure.

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