Lithographic apparatus and device manufacturing method

• US 8,482,845 B2
• Filed: 02/02/2010
• Issued: 07/09/2013
• Est. Priority Date: 06/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Bijlaart, Erik Theodorus Maria, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Van De Kerkhof, Marcus Adrianus, Kolesnychenko, Aleksey Yurievich, Kroon, Mark, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ottens, Joost Jeroen, Straaijer, Alexander, Streefkerk, Bob, Van Santen, Helmar, Den Boef, Arie Jeffrey Maria
• Primary Examiner(s): Pham, Thomas K
• Assistant Examiner(s): THOMAS, BRANDI N
• Application Number:
  US12/698,932
• Publication Number:
  US 20110007285A1
• Time in Patent Office: 1,253 Days
• Field of Search: 359/237, 359/242, 359290-295, 359/298
• US Class Current: 359/298
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system adapted to project a patterned beam of radiation onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; and

a part of a sensor positioned in or on a movable table, the part of the sensor capable of being positioned to be illuminated by a beam of radiation once it has passed through the liquid,

wherein the movable table comprises a member configured to at least partly surround the part of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the part of the sensor.

2. The apparatus according to claim 1, wherein the substrate table comprises a support surface configured to support an intermediary plate between the projection system and the sensor and not in contact with the sensor.

3. The apparatus according to claim 2, wherein the sensor comprises a transmission image sensor configured to sense the beam and wherein the intermediary plate is positionable between the sensor and the projection system.

4. The apparatus according to claim 1, wherein the sensor is on the substrate table.

5. The apparatus according to claim 1, wherein the sensor comprises an alignment sensor configured to align the substrate table relative to the projection system.

6. The apparatus according to claim 5, wherein measurement gratings of the alignment sensor have a pitch of less than 500 nm.

7. The apparatus according to claim 5, wherein the alignment sensor is configured to be illuminated obliquely.

8. The apparatus according to claim 1, wherein the sensor comprises a transmission image sensor.

9. The apparatus according to claim 1, wherein the sensor comprises a focus sensor.

10. The apparatus according to claim 1, wherein the sensor comprises a spot or dose sensor, an integrated lens interferometer and scanner, an alignment mark, or any combination of the foregoing.

11. The apparatus according to claim 1, wherein the sensor is configured to be in contact with the liquid and the beam of radiation is configured to come from the projection system or an alignment system.

12. The apparatus according to claim 1, wherein the beam of radiation is the patterned beam.

13. The apparatus according to claim 1, wherein an alignment system comprises the sensor and is configured receive an alignment beam of radiation from the projection system to align the substrate.

14. The apparatus according to claim 4, wherein the substrate table comprises a vacuum port configured to remove liquid from a space between the substrate table and the sensor.

15. The apparatus according to claim 4, further comprising a bead of material in a space between the substrate table and the sensor configured to prevent entry of the liquid.

16. The apparatus according to claim 1, wherein the movable table is the substrate table.