Photopolymerizable silicone materials forming semipermeable membranes for sensor applications

• US 8,486,615 B2
• Filed: 06/21/2005
• Issued: 07/16/2013
• Est. Priority Date: 08/11/2004
• Status: Expired due to Fees

• Current Assignee: Dow, Inc.
• Original Assignee: Dow, Inc.
• Inventors: Gardner, Geoffrey Bruce, Maghsoodi, Sina, Harkness, Brian Robert
• Primary Examiner(s): Ball, J. Christopher
• Application Number:
  US11/632,193
• Publication Number:
  US 20080277276A1
• Time in Patent Office: 2,947 Days
• Field of Search: 205/793, 204/415, 430/269, 430/496, 430/495.1, 423/325
• US Class Current: 430/496
• CPC Class Codes: C12Q 1/002 Electrode membranes
• CPC Class Codes: G01N 33/5438 Electrodes
• CPC Class Codes: G03F 7/0757 Macromolecular compounds containing Si-O, Si-C or Si-N bonds G03F7/0752 takes precedence
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Abstract

A method for preparing sensing devices (biosensors) includes the steps of: (1) applying a photopatternable silicone composition to a surface in a sensing device to form a film, (2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without the use of a photoresist to produce an exposed film; (3) removing regions of the non-exposed film with a developing solvent to form a patterned film, which forms a permselective layer or an analyte attenuation layer covering preselected areas of the sensing device.

Claims

1. A method comprising:

(1) applying a photopatternable semi-permeable silicone resin composition to a surface in a sensing device to form a film, wherein the sensing device comprises a silicon wafer having a silicon dioxide layer on its surface,

(2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without using a photoresist to produce an exposed film;

(3) removing regions of the non-exposed film with a developing solvent to form a patterned semi-permeable film; and

(4) heating the patterned film,

wherein the photopatternable semi-permeable silicone resin composition comprises;

(a) a curable silicone resin and

(b) a photoinitiator,

wherein the curable silicone resin is selected from an acrylic functional silicone resin of the formula

{[(CH₂═

CR¹³COOR¹⁴)SiO_3/2]_h[R¹⁵SiO_3/2]_i}_j, where

each R¹³ is independently a hydrogen atom or methyl group, each R¹⁴ is independently a hydrocarbylene group having 1 to 8 carbon atoms, each R¹⁵ is independently an alkyl, cyclic alkyl, aryl or alkenyl group having 1 to 8 carbon atoms, wherein h satisfies the inequality 0.05<

h<

0.95, wherein i satisfies the inequality 0.05<

i<

0.95, h+i=1, and j is a value sufficient to give the acrylic functional silicone resin a weight average molecular weight (Mw) of 3,000 to 100,000 grams per mole in terms of polystyrene by gel permeation chromatography, a vinyl ether functional silicone resin, an epoxy functional silicone resin, or a combination thereof.

2. The method of claim 1, further comprising applying a biolayer over at least a portion of the patterned film.

3. The method of claim 2, further comprising applying an analyte attenuation layer over at least a portion of the biolayer.

5. The method of claim 1 or 4, where the surface comprises a wafer on which a first structure comprising a base sensor is mounted.

6. The method of claim 5, further comprising interposing an electrolyte layer between the base sensor and the patterned film.

4. A method comprising:

(1) applying a photopatternable silicone resin composition to a surface in a sensing device to form a film, wherein the sensing device comprises a silicon wafer having a silicon dioxide layer on its surface,

(2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without using a photoresist to produce an exposed film;

(3) removing regions of the non-exposed film with a developing solvent to form a patterned film; and

(4) heating the patterned film,

where the photopatternable silicone resin composition comprises;

(a) a curable silicone resin and

(b) a photoinitiator,

wherein the curable silicone resin is selected from an acrylic functional silicone resin, of the formula

{[(CH₂═

CR¹³COOR¹⁴)SiO_3/2]_h[R¹⁵SiO_3/2]_i}_j, where

each R¹³ is independently a hydrogen atom or methyl group, each R¹⁴ is independently a hydrocarbylene group having 1 to 8 carbon atoms, each R¹⁵ is independently an alkyl, cyclic alkyl, aryl or alkenyl group having 1 to 8 carbon atoms, wherein h satisfies the inequality 0.05<

h<

0.95, wherein i satisfies the inequality 0.05<

i<

0.95, h+i=1, and j is a value sufficient to give the acrylic functional silicone resin a weight average molecular weight (Mw) of 3,000 to 100,000 grams per mole in terms of polystyrene by gel permeation chromatography, a vinyl ether functional silicone resin, an epoxy functional silicone resin, or a combination thereof,

optionally (c) an inhibitor,

optionally (d) a filler,

optionally (e) a treating agent for the filler,

optionally (f) a vehicle,

optionally (g) a spacer,

optionally (h) an adhesion promoter,

optionally (i) a surfactant,

optionally (j) a photosensitizer, and

optionally (k) a colorant.