Process for etching trenches in an integrated optical device
First Claim
1. Process for etching trenches in a structure comprising a support substrate and a multilayer, formed on the substrate, comprising a core layer and coating layers for the definition of wave guides of an integrated optical device, the process comprising:
- Implementing a selective plasma attack in the multilayer through a masking structure that leaves uncovered areas of the multilayer corresponding to the trenches to be etched asymmetrically;
wherein the masking structure is obtained;
forming a mask of metallic material on the multilayer that leaves uncovered the areas corresponding to the trenches to be etched; and
forming a mask of non-metallic material that leaves uncovered regions comprising a portion of one edge of the mask of metallic material, wherein the one edge is on one of the sides of the areas corresponding to the trenches to be etched; and
that leaves covered regions comprising the opposite edge of the mask of metallic material and at least part of the areas corresponding to the trenches to be etched.
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Abstract
The described process allows trenches to be etched in a structure comprising a support substrate and a multilayer, formed on the substrate, for the definition of wave guides of an integrated optical device and comprises a selective plasma attack in the multilayer through a masking structure that leaves uncovered areas of the multilayer corresponding to the trenches to be etched. Such a masking structure is obtained by forming a mask of metallic material on the multilayer that leaves uncovered the areas corresponding to the trenches to be etched and forming a mask of non-metallic material, for example photoresist, on it that leaves uncovered regions comprising at least part of the areas and an edge portion of the mask of metallic material.
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Citations
20 Claims
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1. Process for etching trenches in a structure comprising a support substrate and a multilayer, formed on the substrate, comprising a core layer and coating layers for the definition of wave guides of an integrated optical device, the process comprising:
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Implementing a selective plasma attack in the multilayer through a masking structure that leaves uncovered areas of the multilayer corresponding to the trenches to be etched asymmetrically; wherein the masking structure is obtained; forming a mask of metallic material on the multilayer that leaves uncovered the areas corresponding to the trenches to be etched; and forming a mask of non-metallic material that leaves uncovered regions comprising a portion of one edge of the mask of metallic material, wherein the one edge is on one of the sides of the areas corresponding to the trenches to be etched; and that leaves covered regions comprising the opposite edge of the mask of metallic material and at least part of the areas corresponding to the trenches to be etched. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method, comprising:
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forming on a material a metallic first mask that exposes a region of the material; forming on the first mask a second mask that exposes a section of the region and a portion of the first mask that is contiguous with the section of the region and that covers a section of the region and the first mask that is contiguous with the opposite section of the region; and forming a trench in the exposed section of the material, the trench having a first trench wall that not parallel with a second trench wall. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method, comprising:
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forming a first mask on a material; forming a second mask on the first mask such that a region of the material is exposed, the exposed region bounded on one side by the first mask and the exposed region bounded on a different side by the second mask; and forming a trench in the exposed region of the material. - View Dependent Claims (19, 20)
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Specification