×

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

  • US 8,488,100 B2
  • Filed: 10/08/2010
  • Issued: 07/16/2013
  • Est. Priority Date: 04/11/2003
  • Status: Expired due to Fees
First Claim
Patent Images

1. An immersion exposure apparatus which exposes a substrate with a light beam, the apparatus comprising:

  • an optical member through which the light beam is irradiated onto the substrate;

    a substrate table which holds the substrate and is movable relative to the optical member; and

    a pad member which is movable relative to the substrate table and is positionable opposite to the optical member in place of the substrate table to substantially maintain an immersion liquid in a space under the optical member when the substrate table is moved away from under the optical member,wherein the substrate table and the pad member are relatively tilted and/or moved in a vertical direction before the substrate table is moved away from under the optical member.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×