Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position
First Claim
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1. A lithographic apparatus comprising:
- a substrate table which holds a substrate;
a projection optical system which projects a patterned beam of radiation onto the substrate held by the substrate table;
a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate held by the substrate table;
a liquid detector which detects a liquid remaining on a surface of the substrate while the substrate is held by the substrate table; and
a controller that controls the liquid detector to detect the liquid remaining on the surface of the substrate after the substrate has been exposed by the patterned beam at the exposure position and before the exposed substrate is unloaded from the substrate table at an unload position,wherein the substrate held by the substrate table passes a detection area of the liquid detector on a way from the exposure position to the unload position.
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Abstract
A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.
159 Citations
30 Claims
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1. A lithographic apparatus comprising:
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a substrate table which holds a substrate; a projection optical system which projects a patterned beam of radiation onto the substrate held by the substrate table; a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate held by the substrate table; a liquid detector which detects a liquid remaining on a surface of the substrate while the substrate is held by the substrate table; and a controller that controls the liquid detector to detect the liquid remaining on the surface of the substrate after the substrate has been exposed by the patterned beam at the exposure position and before the exposed substrate is unloaded from the substrate table at an unload position, wherein the substrate held by the substrate table passes a detection area of the liquid detector on a way from the exposure position to the unload position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A liquid detecting method comprising:
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holding a substrate on a substrate table; supplying a liquid to a space between a projection optical system and the substrate held by the substrate table; projecting a patterned beam of radiation onto the substrate held by the substrate table via the projection optical system and the liquid at an exposure position; and detecting a liquid remaining on a surface of the substrate after the patterned beam is projected onto the substrate, wherein the detection for the remaining liquid is executed while the substrate is held by the substrate table and before the exposed substrate is unloaded from the substrate table at an unload position, and wherein the exposed substrate held by the substrate table passes a detection area for detecting the remaining liquid on a way from the exposure position to the unload position. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification
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Current AssigneeNikon Corporation
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Original AssigneeNikon Corporation
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InventorsTakaiwa, Hiroaki, Horiuchi, Takashi
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Primary Examiner(s)Ton, Toan
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Assistant Examiner(s)LIU, CHIA HOW MICHAEL
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Application NumberUS13/067,867Publication NumberTime in Patent Office747 DaysField of Search355/30, 355/53US Class Current355/30CPC Class CodesG03B 27/42 for automatic sequential co...G03F 7/70341 Details of immersion lithog...G03F 7/7085 Detection arrangement, e.g....G03F 7/70916 Pollution mitigation, i.e. ...
