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Exposure method, exposure apparatus, and device manufacturing method

  • US 8,488,109 B2
  • Filed: 08/20/2010
  • Issued: 07/16/2013
  • Est. Priority Date: 08/25/2009
  • Status: Active Grant
First Claim
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1. An exposure method in which a pattern is sequentially formed on a plurality of shot areas arranged on an object, the method comprising:

  • measuring a positional information of a movable body which moves along a predetermined plane holding the object by a first measurement system which irradiates a first measurement beam on a first measurement plane and receives a reflected beam, and performing a constant speed drive of the movable body in a scanning direction to form the pattern in each of the plurality of shot areas using the measurement results of the first measurement system;

    measuring a positional information of the movable body by a second measurement system which irradiates a second measurement beam on a second measurement plane different from the first measurement plane, and receives a reflected beam, and performing a stepping drive of the movable body toward a starting position of the constant speed drive to form the pattern in each of the plurality of shot areas using the measurement results of the second measurement system; and

    switching a measurement system which obtains the positional information used to drive the movable body from one of the first measurement system and the second measurement system to the other of the first measurement system and the second measurement system, in accordance with whether the constant speed drive or the stepping drive is being performed.

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