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Chamber match using important variables filtered by dynamic multivariate analysis

  • US 8,489,218 B2
  • Filed: 10/15/2010
  • Issued: 07/16/2013
  • Est. Priority Date: 10/15/2010
  • Status: Active Grant
First Claim
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1. A method of modifying a chamber in a semiconductor manufacturing facility, the method comprising:

  • identifying a first, golden chamber operable to implement a semiconductor process;

    identifying a second, reference chamber operable for the semiconductor process;

    extracting a matching index of a third, processing chamber relative to the golden chamber and the reference chamber using a dynamic variable analysis; and

    modifying the third, processing chamber according to the matching index,wherein the extracting of the matching index includes determining a first distance in a predictive parameter between the golden chamber and the reference chamber, and comparing the first distance to a determined second distance in the predictive parameter between the golden chamber and the processing chamber.

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