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Lithographic error reduction by pattern matching

  • US 8,495,525 B1
  • Filed: 03/20/2012
  • Issued: 07/23/2013
  • Est. Priority Date: 03/20/2012
  • Status: Expired due to Fees
First Claim
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1. A method for generating a list of real errors from a list of raw errors, said method comprising:

  • generating a library of waivable images with corresponding waiver constraints, wherein each of said waivable images is an image of a region of a reference design layout including a raw error as determined by an optical rule checks (ORC) program and does not require a correction for printability on a photoresist layer;

    generating a list of raw errors by running said ORC program on a target design layout;

    generating error region images corresponding to said list of raw errors;

    generating a list of matches between said library of waivable images and said error region images; and

    removing a subset of raw errors that correspond to a subset of said list of matches from said list of raw errors to generate a list of real errors.

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