Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process
First Claim
1. A computer-implemented method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns to be imaged separately, comprising the steps of:
- (a) defining a region of influence which indicates the minimum necessary space between features to be imaged;
(b) selecting a vertex associated with a feature of said target pattern,(c) determining, by the computer, if an edge of another feature is within said region of influence with respect to said vertex, and placing a new vertex created by applying a fragmentation process, if said edge of said another feature is within said region of influence; and
(d) splitting said another feature into two polygons, whose common edge includes said new vertex created by applying said fragmentation process, for separate inclusion into different ones of said multiple patterns when it is determined that said edge of another feature is within said region of influence.
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Accused Products
Abstract
A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of the target pattern; (c) determining if an edge of another feature is within the region of influence with respect to the vertex; and (d) splitting the another feature into two polygons if the edge of another feature is within the region of influence.
34 Citations
18 Claims
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1. A computer-implemented method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns to be imaged separately, comprising the steps of:
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(a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining, by the computer, if an edge of another feature is within said region of influence with respect to said vertex, and placing a new vertex created by applying a fragmentation process, if said edge of said another feature is within said region of influence; and (d) splitting said another feature into two polygons, whose common edge includes said new vertex created by applying said fragmentation process, for separate inclusion into different ones of said multiple patterns when it is determined that said edge of another feature is within said region of influence. - View Dependent Claims (2, 3, 4, 5, 17)
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6. A non-transitory computer readable medium bearing a computer program for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns to be imaged separately, the computer program, when executed, causing a computer to perform the steps of:
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(a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining if an edge of another feature is within said region of influence with respect to said vertex, and placing a new vertex created by applying a fragmentation process, if said edge of said another feature is within said region of influence; and (d) splitting said another feature into two polygons, whose common edge includes said new vertex created by applying said fragmentation process, for separate inclusion into different ones of said multiple patterns when it is determined that said edge of another feature is within said region of influence. - View Dependent Claims (7, 8, 9, 10)
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11. A device manufacturing method comprising the steps of:
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(a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using an imaging system; (c) using a target pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c), said mask is formed by a method comprising the steps of; (e) defining a region of influence which indicates a minimum necessary space between features of said target pattern to be imaged; (f) selecting a vertex associated with a feature of said target pattern, (g) determining if an edge of another feature is within said region of influence with respect to said vertex, and placing a new vertex created by applying a fragmentation process, if said edge of said another feature is within said region of influence; and (h) splitting said another feature into two polygons, whose common edge includes said new vertex created by applying said fragmentation process, for separate inclusion into different ones of said multiple patterns to be imaged separately when it is determined that said edge of another feature is within said region of influence.
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12. A computer-implemented method for generating masks to be imaged separately in a photolithography process, said method comprising the steps of:
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(a) defining a region of influence which indicates a minimum necessary space between features of a target pattern to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining, by the computer, if an edge of another feature is within said region of influence with respect to said vertex, and placing a new vertex created by applying a fragmentation process, if said edge of said another feature is within said region of influence; and (d) splitting said feature into two polygons, whose common edge includes said new vertex created by applying said fragmentation process, for separate inclusion into different ones of said multiple patterns when it is determined that said edge of another feature is within said region of influence. - View Dependent Claims (13, 14, 15, 16, 18)
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Specification