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Method for manufacturing polishing pad

  • US 8,500,932 B2
  • Filed: 11/11/2011
  • Issued: 08/06/2013
  • Est. Priority Date: 04/19/2006
  • Status: Expired due to Fees
First Claim
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1. A method for manufacturing a polishing pad, comprising the steps of:

  • preparing a cell-dispersed urethane composition by a mechanical foaming method;

    feeding a face material in a feeding direction;

    while feeding the face material, feeding in the feeding direction a first spacer on the face material so as to be at one end of a width direction of the face material, feeding in the feeding direction a second spacer on the face material so as to be at other end of the width direction of the face material, and feeding in the feeding direction a third spacer on the face material so as to be between the first and second spacers;

    continuously discharging said cell-dispersed urethane composition onto a part of said face material where the spacers are not provided;

    laminating another face material on said discharged cell-dispersed urethane composition;

    curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a long polishing layer comprising a polyurethane foam is formed; and

    cutting the long polishing layer.

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