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Amorphous oxide semiconductor, semiconductor device, thin film transistor and display device

  • US 8,502,222 B2
  • Filed: 02/23/2012
  • Issued: 08/06/2013
  • Est. Priority Date: 04/25/2007
  • Status: Active Grant
First Claim
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1. A display device comprising a thin film transistor comprising:

  • a channel layer;

    a source electrode electrically connected to said channel layer;

    a drain electrode electrically connected to said channel layer; and

    a gate electrode adjacent to said channel layer with a gate insulating film interposed therebetween,said channel layer comprising an oxide semiconductor comprising at least one element selected from In, Ga, and Zn at an atomic ratio of InxGayZnz, wherein a mass density M of said oxide semiconductor is represented by relational expression (1) shown below;


    M≧

    0.94×

    (7.121x+5.941y+5.675z)/(x+y+z) 



    (1)where 0≦

    x≦

    1, 0≦

    y≦

    1, 0≦

    z≦

    1, and x+y+z≠

    0.

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