Printing semiconductor elements by shear-assisted elastomeric stamp transfer
First Claim
1. A method of printing a transferable semiconductor element, said method comprising:
- providing an elastomeric stamp having a transfer surface with said semiconductor element supported thereon, wherein said transfer surface comprises a three-dimensional pattern of relief features that at least partially contacts said semiconductor element;
providing a substrate having a receiving surface;
establishing conformal contact between said semiconductor element supported on said elastomeric stamp transfer surface and said receiving surface, thereby contacting at least a portion of said semiconductor element with said receiving surface;
offsetting said elastomeric stamp a horizontal distance relative to said receiving surface, thereby generating a mechanical deformation in at least a portion of said pattern of relief features without separating said semiconductor element from said transfer surface or said receiving surface; and
separating said stamp from said receiving surface, thereby printing said semiconductor element to said receiving surface;
wherein said offsetting step displaces relative to the substrate an upper portion of the relief feature without displacing relative to the substrate the stamp transfer surface that supports the semiconductor element;
wherein the relief feature upper portion is separated from the stamp transfer surface by a vertical distance.
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Accused Products
Abstract
Provided are methods and devices for transfer printing of semiconductor elements to a receiving surface. In an aspect, the printing is by conformal contact between an elastomeric stamp inked with the semiconductor elements and a receiving surface, and during stamp removal, a shear offset is applied between the stamp and the receiving surface. The shear-offset printing process achieves high printing transfer yields with good placement accuracy. Process parameter selection during transfer printing, including time varying stamp-backing pressure application and vertical displacement, yields substantially constant delamination rates with attendant transfer printing improvement.
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Citations
29 Claims
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1. A method of printing a transferable semiconductor element, said method comprising:
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providing an elastomeric stamp having a transfer surface with said semiconductor element supported thereon, wherein said transfer surface comprises a three-dimensional pattern of relief features that at least partially contacts said semiconductor element; providing a substrate having a receiving surface; establishing conformal contact between said semiconductor element supported on said elastomeric stamp transfer surface and said receiving surface, thereby contacting at least a portion of said semiconductor element with said receiving surface; offsetting said elastomeric stamp a horizontal distance relative to said receiving surface, thereby generating a mechanical deformation in at least a portion of said pattern of relief features without separating said semiconductor element from said transfer surface or said receiving surface; and separating said stamp from said receiving surface, thereby printing said semiconductor element to said receiving surface; wherein said offsetting step displaces relative to the substrate an upper portion of the relief feature without displacing relative to the substrate the stamp transfer surface that supports the semiconductor element;
wherein the relief feature upper portion is separated from the stamp transfer surface by a vertical distance. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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Specification