Method of manufacturing a coordinate detector

• US 8,507,183 B2
• Filed: 02/03/2012
• Issued: 08/13/2013
• Est. Priority Date: 05/15/2008
• Status: Expired due to Fees

• Current Assignee: Fujitsu Component Limited (Fujitsu Limited)
• Original Assignee: Fujitsu Component Limited (Fujitsu Limited)
• Inventors: Kondoh, Koichi
• Primary Examiner(s): WU, SHEAN CHIU
• Application Number:
  US13/365,410
• Publication Number:
  US 20120125881A1
• Time in Patent Office: 557 Days
• Field of Search: 430/311, 430/313, 216/16
• US Class Current: 430/311
• CPC Class Codes: G06F 3/045 using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact

Abstract

A method of manufacturing a coordinate detector having a resistive film and a common electrode for applying a voltage to the resistive film is disclosed that includes the steps of (a) applying a photoresist onto the resistive film formed on a substrate formed of an insulator; (b) forming a resist pattern on the resistive film by exposing the applied photoresist to light through a predetermined mask and subsequently developing the applied photoresist; (c) forming a resistive film removal region by removing a portion of the resistive film without the resist pattern; (d) removing the resist pattern after step (c); and (e) forming the common electrode over the resistive film removal region after step (d).

Claims

1. A method of manufacturing a coordinate detector having a resistive film and a common electrode for applying a voltage to the resistive film, the method comprising:

printing an etching paste on a portion of the resistive film formed on a substrate formed of an insulator, the portion being to be removed to form a resistive film removal region;

removing the portion of the resistive film with the etching paste by heat treatment;

removing the remaining etching paste after the heat treatment; and

forming the common electrode over the resistive film removal region.

2. The method as claimed in claim 1, wherein the resistive film removal region includes a first part formed by removing the portion of the resistive film and a second part formed of the resistive film remaining inside the first part, and

the first part electrically insulates the second part and the resistive film outside the first part.

3. A method of manufacturing a coordinate detector having a resistive film and a common electrode for applying a voltage to the resistive film, the method comprising:

printing an etching paste on a portion of the resistive film formed on a substrate formed of an insulator, the portion being to be removed to form a resistive film removal region;

removing the portion of the resistive film with the etching paste by heat treatment; and

removing the remaining etching paste after the heat treatment,

wherein the common electrode is formed between a peripheral edge of the resistive film and the resistive film removal region so that a distance between adjacent sides of the common electrode and the resistive film removal region is more than or equal to 0 mm and less than or equal to 5 mm.

4. The method as claimed in claim 3, wherein the resistive film removal region includes a first part formed by removing the portion of the resistive film and a second part formed of the resistive film remaining inside the first part, and

the first part electrically insulates the second part and the resistive film outside the first part.