Exposure apparatus, exposure method, and method for producing device

• US 8,508,713 B2
• Filed: 07/20/2007
• Issued: 08/13/2013
• Est. Priority Date: 06/10/2004
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Original Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Inventors: Nagasaka, Hiroyuki, Okuyama, Takeshi
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US11/878,075
• Publication Number:
  US 20070263195A1
• Time in Patent Office: 2,216 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.

Claims

1. A lithographic projection apparatus in which a pattern is projected onto a substrate through a liquid confined to a space adjacent the substrate, the apparatus comprising:

a projection system by which the pattern is projected onto the substrate;

a liquid diverter in the space to promote liquid flow across the space from a first side of the space to a second side of the space, the first side and the second side being separated along a circumference of the space, the liquid diverter having an upper surface and a lower surface, the upper surface being provided such that the upper surface faces an end surface of the projection system and a gap is formed between the upper surface and the end surface of the projection system, and the lower surface being provided such that the substrate faces the lower surface and a gap is formed between the lower surface and the substrate when projecting the pattern onto the substrate;

a liquid confinement member with which the liquid is confined to the space, the liquid confinement member including the liquid diverter;

a liquid supply inlet from which the liquid is supplied to the gap between the upper surface and the end surface of the projection system; and

an extraction port from which the supplied liquid is removed, wherein

when projecting the pattern onto the substrate, the extraction port removes the liquid which comes from the gap between the upper surface of the liquid diverter and the end surface of the projection system, via the gap between the lower surface of the liquid diverter and the substrate, to a gap between the extraction port and the substrate.

2. The apparatus of claim 1, wherein the liquid diverter diverts the liquid in a direction substantially parallel to the plane of the substrate.

3. The apparatus of claim 1, wherein a portion of the liquid diverter extends in a direction perpendicular to the plane of the substrate, the portion defining an opening that allows fluid communication between the gap between the upper surface and the end surface of the projection system and the gap between the lower surface and the substrate.

4. The apparatus of claim 1, wherein the projected pattern is projected to an image field and the liquid diverter is positioned on each side of the image field.

5. The apparatus of claim 1, wherein the liquid diverter promotes the liquid flow across the space from one side to an opposite side.

6. The apparatus of claim 1, wherein the liquid diverter is curved to promote the liquid to flow in a curved path.

7. The apparatus of claim 1, wherein the liquid diverter has an elongate horizontal cross-section.

8. The apparatus of claim 1, wherein the liquid diverter is solid.

9. The apparatus of claim 1, wherein the liquid diverter includes a plurality of liquid diverter portions.

10. The apparatus of claim 1, wherein the liquid diverter divides the space.

11. The apparatus of claim 1, wherein the liquid confinement member has the extraction port configured to remove the liquid.

12. A device manufacturing method, comprising:

projecting a patterned beam of radiation using a projection system onto a substrate through a liquid provided in a space adjacent the substrate, wherein flow of the liquid across the space is promoted by a liquid diverter in the space, the liquid diverter having an upper surface and a lower surface, the upper surface being provided such that the upper surface faces an end surface of the projection system and a gap is formed between the upper surface and the end surface of the projection system, and the lower surface being provided such that the substrate faces the lower surface and a gap is formed between the lower surface and the substrate when projecting the patterned beam onto the substrate;

supplying the liquid to the gap between the upper surface and the end surface of the projection system; and

removing, from an extraction port, the liquid which comes from the gap between the upper surface of the liquid diverter and the end surface of the projection system, via the gap between the lower surface of the liquid diverter and the substrate, to a gap between the extraction port and the substrate.

13. The method of claim 12, wherein the liquid is confined to the space using a liquid confinement member which has the liquid diverter.

14. The method of claim 12, wherein the liquid diverter has an elongate horizontal cross-section.

15. The method of claim 12, wherein the liquid diverter divides the space.