Lithographic apparatus and device manufacturing method utilizing data filtering

• US 8,508,715 B2
• Filed: 10/29/2010
• Issued: 08/13/2013
• Est. Priority Date: 03/30/2005
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Tinnemans, Patricius Aloysius Jacobus, Baselmans, Johannes Jacobus Matheus
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US12/915,566
• Publication Number:
  US 20110043778A1
• Time in Patent Office: 1,019 Days
• Field of Search: 355/52, 355/53, 355/55, 355/67, 356399-401
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

Claims

1. A system, comprising:

a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation;

a modulator configured to modulate the sub-beams of radiation to substantially form a requested dose pattern on the substrate, the requested dose pattern being built up over time from an array of spot exposures, each of the spot exposures being produced by one of the sub-beams of radiation at a given time;

a rasterizer configured to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern;

a controller configured to receive the sequence of data and generate a control signal therefrom, the control signal being used to control the modulator; and

a focus determination unit configured to measure a position of at least a portion of the substrate relative to a plane of best focus,

wherein the controller comprises a focus compensation unit, the focus compensation unit configured to change the control signal based on measured deviations of the position of at least the portion of the substrate relative to the plane of best focus.

2. The system of claim 1, wherein the focus determination unit comprises:

at least one ultrasonic transducer and receiver, rigidly connected to the projection system and configured to measure the position of the substrate surface relative to the projection system, at one or more points, by measuring travel time of reflected ultrasonic waves.

3. The system of claim 1, wherein the modulator comprises an array of individually controllable elements configured to provide the sub-beams of radiation.

4. The system of claim 1, wherein the modulator comprises an array of individually controllable elements configured to pattern the sub-beams of radiation.

6. The system of claim 1, wherein the focus determination unit is further configured to output a coarse adjustment signal and focus data based on the measured deviations of the position of at least the portion of the substrate relative to the plane of best focus.

7. The system of claim 6, wherein the controller is further configured to receive the coarse adjustment signal and perform a coarse adjustment to at least one of a position of the projection system and a position of a substrate table.

8. The system of claim 6, wherein the focus compensation unit is configured to generate a fine adjustment signal based on the focus data to change the control signal.

9. The system of claim 6, wherein the focus compensation unit is configured to receive the coarse adjustment signal and generate a fine adjustment signal based on the focus data and the coarse adjustment signal to change the control signal.

10. The system of claim 1, wherein the focus compensation unit is configured to change the control signal substantially simultaneously with an exposure of the substrate by the array of sub-beams of radiation.

5. A method, comprising:

projecting a beam of radiation onto a substrate as an array of sub-beams of radiation;

modulating the sub-beams of radiation to substantially form a requested dose pattern on the substrate, the requested dose pattern being built up over time from an array of spot exposures, each of the spot exposures being produced by one of the sub-beams of radiation at a given time;

converting data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern;

generating a control signal from the sequence of data that is used to control the modulating;

measuring the position of at least a portion of the substrate relative to a plane of best focus; and

modifying the control signal based on measured deviations of the position of at least a portion of the substrate relative to the plane of best focus.

11. The method of claim 5, further comprising:

generating a coarse adjustment signal and focus data based on the measured deviations of the position of at least the portion of the substrate relative to the plane of best focus.

12. The method of claim 11, further comprising:

performing a coarse adjustment to at least one of a position of a projection system and a position of a substrate table based on the coarse adjustment signal.

13. The method of claim 11, further comprising:

generating a fine adjustment signal based on the focus data;

wherein the modifying further comprises changing the control signal based on the fine adjustment signal.

14. The method of claim 11, further comprising:

generating a fine adjustment signal based on the focus data and the coarse adjustment signal;

wherein the modifying further comprises changing the control signal based on the fine adjustment signal.

15. The method of claim 5, wherein the modifying further comprises:

changing the control signal substantially simultaneously with an exposure of a substrate by the array of sub-beams of radiation.

16. A lithography apparatus, comprising:

a patterning device configured to modulate a beam of radiation as an array of sub-beams of radiation, the sub-beams of radiation substantially forming a requested dose pattern on a substrate;

a projection system configured to project the modulated sub-beams of radiation onto the substrate;

a focus determination unit configured to measure a position of at least a portion of the substrate relative to a plane of best focus and output a coarse adjustment signal and focus data;

a controller configured to receive the coarse adjustment signal and perform a coarse adjustment to a position of the projection system and a position of a substrate table based on the coarse adjustment signal;

a rasterizer configured to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern;

a data path control device configured to;

receive the sequence of data and generate a control signal therefrom, the control signal being used to control the patterning device; and

receive the focus data and generate a fine adjustment signal, the fine adjustment signal configured to change the control signal based on measured deviations of the position of at least a portion of the substrate relative to the plane of best focus.

17. The lithographic apparatus of claim 16, wherein the requested dose pattern is built up over time from an array of spot exposures, each of the spot exposures being produced by one of the sub-beams of radiation at a given time.

18. The lithographic apparatus of claim 16, wherein the patterning device comprises an array of individually controllable elements configured to provide the sub-beams of radiation.

19. The lithographic apparatus of claim 16, wherein the patterning device comprises an array of individually controllable elements configured to pattern the sub-beams of radiation.

20. The lithographic apparatus of claim 16, wherein the data path control device is configured to change the control signal substantially simultaneously with an exposure of the substrate by the array of sub-beams of radiation.