Forming inductor and transformer structures with magnetic materials using damascene processing for integrated circuits
First Claim
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1. A structure comprising:
- a first layer of magnetic material disposed in a first dielectric layer;
at least one first via is disposed in the first dielectric layer;
a barrier layer disposed in the at least one first via that is disposed in the first dielectric layer;
a conductive material disposed on the barrier layer in the first dielectric layer;
a second dielectric layer disposed on the first magnetic layer;
at least one second via and at least one conductive structure disposed in the second dielectric layer, the at least one second via and the at least one conductive structure comprising a barrier layer;
a conductive material disposed in the at least one second via and in the at least one conductive structure in the second dielectric layer;
a third layer of dielectric material disposed on the conductive structure and at least one second via in the second dielectric layer; and
a second layer of magnetic material disposed within a portions of the second and the third layer of dielectric material, wherein the first and second layers of the magnetic material are coupled to one another.
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Abstract
Methods and associated structures of forming microelectronic devices are described. Those methods may include forming a first layer of magnetic material and at least one via structure disposed in a first dielectric layer, forming a second dielectric layer disposed on the first magnetic layer, forming at least one conductive structure disposed in the second dielectric layer, forming a third layer of dielectric material disposed on the conductive structure, forming a second layer of magnetic material disposed in the third layer of dielectric material and in the second layer of dielectric material, wherein the first and second layers of the magnetic material are coupled to one another.
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8 Claims
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1. A structure comprising:
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a first layer of magnetic material disposed in a first dielectric layer; at least one first via is disposed in the first dielectric layer; a barrier layer disposed in the at least one first via that is disposed in the first dielectric layer; a conductive material disposed on the barrier layer in the first dielectric layer; a second dielectric layer disposed on the first magnetic layer; at least one second via and at least one conductive structure disposed in the second dielectric layer, the at least one second via and the at least one conductive structure comprising a barrier layer; a conductive material disposed in the at least one second via and in the at least one conductive structure in the second dielectric layer; a third layer of dielectric material disposed on the conductive structure and at least one second via in the second dielectric layer; and a second layer of magnetic material disposed within a portions of the second and the third layer of dielectric material, wherein the first and second layers of the magnetic material are coupled to one another. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification