Exposure method and apparatus, maintenance method and device manufacturing method
First Claim
1. An exposure method for exposing a substrate, the exposure method comprising:
- forming a liquid immersion area on the substrate held by a holding portion of a substrate stage to expose the substrate with an exposure light through an immersion liquid of the liquid immersion area; and
cleaning the substrate stage by moving the substrate stage relative to a liquid immersion area of a cleaning liquid during a period in which the substrate is not exposed,wherein during the cleaning, the holding portion holds a dummy substrate having an upper surface portion and an edge portion which is more liquid-attractive than the upper surface portion.
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Accused Products
Abstract
An exposure method includes holding a substrate held by a substrate holder on a substrate stage moving on an image plane side of a projection optical system; forming an immersion area the image plane side of the projection optical system by using a liquid supplied from a liquid supplying mechanism; and exposing a substrate by exposure light via the projection optical system and the immersion area. During a period when exposure of the substrate is not performed, an upper portion of the substrate holder is cleaned by moving the substrate stage relative to the immersion area, and an upper portion of a measuring stage is cleaned by moving the measuring stage relative to the immersion area. A cleaning liquid can be used as a liquid for forming the immersion area during cleaning. High-resolution immersion exposure is performed at a high throughput by suppressing entering of foreign materials into the liquid.
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Citations
59 Claims
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1. An exposure method for exposing a substrate, the exposure method comprising:
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forming a liquid immersion area on the substrate held by a holding portion of a substrate stage to expose the substrate with an exposure light through an immersion liquid of the liquid immersion area; and cleaning the substrate stage by moving the substrate stage relative to a liquid immersion area of a cleaning liquid during a period in which the substrate is not exposed, wherein during the cleaning, the holding portion holds a dummy substrate having an upper surface portion and an edge portion which is more liquid-attractive than the upper surface portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. An exposure apparatus which exposes a substrate with an exposure light through an immersion liquid, the exposure apparatus comprising:
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a substrate stage having a holding portion which holds the substrate; a liquid immersion system having a supply port; and a controller which moves the substrate stage, the controller moving the substrate stage relative to a liquid immersion area of a cleaning liquid supplied from the supply port so as to clean the substrate stage during a period in which the substrate is not exposed, wherein during the cleaning, the holding portion holds a dummy substrate such that a gap is formed along an edge portion of the dummy substrate, the dummy substrate having an upper surface portion and the edge portion being more liquid-attractive than the upper surface portion, the controller moves the substrate stage relative to the liquid immersion area of the cleaning liquid, and the cleaning liquid, which has inflowed through the gap, is recovered from a recovery portion of the substrate stage. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48)
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49. A maintenance method for an exposure apparatus which forms a liquid immersion area of an immersion liquid on a substrate held by a holding portion of a substrate stage and which exposes the substrate with an exposure light through the immersion liquid of the liquid immersion area, the maintenance method comprising:
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arranging the substrate stage to be opposite to a liquid immersion member which performs at least one of supply and recovery of the immersion liquid to form the liquid immersion area; and moving the substrate stage relative to a liquid immersion area of a cleaning liquid to clean at least one of the liquid immersion member and the substrate stage during a period in which the substrate is not exposed, wherein during the cleaning, the holding portion holds a dummy substrate having an upper surface portion and an edge portion which is more liquid-attractive than the upper surface portion. - View Dependent Claims (50, 51, 52, 53, 54, 55, 56, 57, 58, 59)
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Specification