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Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

  • US 8,514,367 B2
  • Filed: 07/10/2007
  • Issued: 08/20/2013
  • Est. Priority Date: 04/11/2003
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • a substrate table on which a substrate is held;

    a projection system that projects a patterned beam onto a target portion of the substrate held by the substrate table, an immersion liquid, through which the beam is to be projected, being in a space between the projection system and the substrate; and

    a flat pad that keeps the projection system in contact with the immersion liquid when the substrate, at least while held on the substrate table, comes out of contact with the immersion liquid, the flat pad being separate from the substrate table.

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