Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
First Claim
1. An exposure apparatus that exposes a substrate with an illumination beam via a projection optical system, the apparatus comprising:
- a frame structure that supports the projection optical system;
a stage system which has a substrate stage placed under the projection optical system that is supported by the frame structure and an electromagnetic motor coupled to the substrate stage, and which moves the substrate by driving the substrate stage by the electromagnetic motor, the substrate stage including a substrate mounting portion, the substrate being mounted on an upper side of the substrate mounting portion, and a grating surface being placed on a lower side of the substrate mounting portion and having a grating area where a grating is formed; and
an encoder system which has an optical member supported to be placed lower than the grating surface by the frame structure, and which irradiates the grating surface with a measurement beam from below via the optical member to measure positional information of the substrate stage, the optical member facing the grating surface as the substrate stage is placed facing the projection optical system, whereinthe grating surface is moved relative to the optical member in a first direction and a second direction orthogonal to an optical axis of the projection optical system and orthogonal to each other as the substrate stage moves,the measurement beam is irradiated on the grating so that a measurement point irradiated with the measurement beam is not moved off from the grating area which is moved relative to the optical member, with respect to the first and the second directions, during at least an exposure operation of the substrate, andthe measurement point is located under an exposure area on which the illumination beam is irradiated via the projection optical system and within the exposure area with respect to the first and the second directions.
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Abstract
A laser beam emitted by an encoder main body enters a wafer table via a PBS from the outside, and reaches a grating at a point that is located right under exposure area, and is diffracted by the grating. Then, by receiving interference light of a first polarized component that has returned from the grating and a second polarized component reflected by the PBS, positional information of the wafer table is measured. Accordingly, because the first polarized component, which has passed through PBS passes through the wafer table until it is synthesized with the second polarized component again, does not proceed through the atmosphere outside, position measurement of the wafer table can be performed with high precision without the measurement beam being affected by the fluctuation of the atmosphere around the wafer table.
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Citations
85 Claims
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1. An exposure apparatus that exposes a substrate with an illumination beam via a projection optical system, the apparatus comprising:
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a frame structure that supports the projection optical system; a stage system which has a substrate stage placed under the projection optical system that is supported by the frame structure and an electromagnetic motor coupled to the substrate stage, and which moves the substrate by driving the substrate stage by the electromagnetic motor, the substrate stage including a substrate mounting portion, the substrate being mounted on an upper side of the substrate mounting portion, and a grating surface being placed on a lower side of the substrate mounting portion and having a grating area where a grating is formed; and an encoder system which has an optical member supported to be placed lower than the grating surface by the frame structure, and which irradiates the grating surface with a measurement beam from below via the optical member to measure positional information of the substrate stage, the optical member facing the grating surface as the substrate stage is placed facing the projection optical system, wherein the grating surface is moved relative to the optical member in a first direction and a second direction orthogonal to an optical axis of the projection optical system and orthogonal to each other as the substrate stage moves, the measurement beam is irradiated on the grating so that a measurement point irradiated with the measurement beam is not moved off from the grating area which is moved relative to the optical member, with respect to the first and the second directions, during at least an exposure operation of the substrate, and the measurement point is located under an exposure area on which the illumination beam is irradiated via the projection optical system and within the exposure area with respect to the first and the second directions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 38, 39, 40, 41)
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32. An exposure method of exposing a substrate with an illumination beam via a projection optical system, the method comprising:
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moving the substrate by a stage system which has a substrate stage and an electromagnetic motor coupled to the substrate stage, the substrate stage including a substrate mounting portion, the substrate being mounted on an upper side of the substrate mounting portion, and a grating surface being placed on a lower side of the substrate mounting portion and having a grating area where a grating is formed; and measuring positional information of the substrate stage by an encoder system having an optical member which is supported to be placed lower than the grating surface by a frame structure that supports the projection optical system, the encoder system irradiating the grating surface with a measurement beam from below via the optical member that faces the grating surface as the substrate stage is placed facing the projection optical system; and controlling driving of the substrate stage by the electromagnetic motor based on the positional information measured by the encoder system, wherein the grating surface is moved relative to the optical member in a first and a second direction orthogonal to an optical axis of the projection optical system and orthogonal to each other as the substrate stage moves, the measurement beam is irradiated on the grating so that a measurement point irradiated with the measurement beam is not moved off from the grating area which is moved relative to the optical member, with respect to the first and the second directions, during at least an exposure operation of the substrate, and the measurement point is located under an exposure area on which the illumination beam is irradiated via the projection optical system and within the exposure area with respect to the first and the second directions. - View Dependent Claims (33, 34, 35, 36, 37, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61)
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62. A manufacturing method of an exposure apparatus that exposes a substrate with an illumination beam via a projection optical system, the method comprising:
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supporting the projection optical system by a frame structure; providing a stage system which has a substrate stage and an electromagnetic motor coupled to the substrate stage, and which moves the substrate by driving the substrate stage by the electromagnetic motor, the substrate stage including a substrate mounting portion, the substrate being mounted on an upper side of the substrate mounting portion, and a grating surface being placed on a lower side of the substrate mounting portion and having a grating area where a grating is formed; and providing an encoder system which has an optical member supported to be placed lower than the grating surface by the frame structure, and measures positional information of the substrate stage, the encoder system irradiating the grating surface with a measurement beam from below via the optical member facing the grating surface as the substrate stage is placed facing the projection optical system, wherein the grating surface is moved relative to the optical member in a first and a second direction orthogonal to an optical axis of the projection optical system and orthogonal to each other as the substrate stage moves, the measurement beam is irradiated on the grating so that a measurement point irradiated with the measurement beam is not moved off from the grating area which is moved relative to the optical member, with respect to the first and the second directions, during at least an exposure operation of the substrate, and the measurement point is located under an exposure area on which the illumination beam is irradiated via the projection optical system and within the exposure area with respect to the first and the second directions. - View Dependent Claims (63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85)
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Specification