Method of making ITO-coated article for use with electronic device

• US 8,518,221 B2
• Filed: 11/05/2012
• Issued: 08/27/2013
• Est. Priority Date: 11/18/2008
• Status: Expired due to Fees

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Krasnov, Alexey
• Primary Examiner(s): YOUNG, CHRISTOPHER G
• Application Number:
  US13/668,732
• Publication Number:
  US 20130059065A1
• Time in Patent Office: 295 Days
• Field of Search: 204/192.15, 204/192.29
• US Class Current: 204/192.29
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C23C 14/086 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 14/5806 Thermal treatment
• CPC Class Codes: G02F 1/13338 Input devices, e.g. touch panels

Abstract

Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) film is sputter-deposited onto a glass substrate at room temperature. The glass substrate with the as-deposited film thereon is subjected to elevated temperatures. Thermal tempering or heat strengthening causes the as-deposited film to be transformed into a crystalline transparent conductive ITO film. Advantageously, this may reduce the cost of touch panel assemblies, e.g., because of the higher rates of the ITO deposition in the metallic mode. The cost of touch-panel assemblies may be further reduced through the use of float glass.

Claims

1. A method of making a coated article for use in an electronic device, the method comprising:

sputtering a film comprising substantially sub-oxidized indium tin oxide (ITO) and/or metallic-mode indium-tin, directly or indirectly, on a glass substrate via a target comprising indium and tin, said sputtering being performed at or close to room temperature;

heat treating the substrate with the film comprising substantially sub-oxidized ITO and/or metallic-mode indium-tin such that the substantially sub-oxidized ITO and/or metallic-mode indium-tin is transformed into a substantially transparent and electrically conductive crystalline resultant film comprising ITO, wherein the substantially transparent and electrically conductive crystalline resultant film comprising ITO is for use as a conductor in an electronic device.

2. The method of claim 1, wherein the target has an In/Sn weight ratio from 95/5 to 80/20.

3. The method of claim 1, wherein said film, after the heat treating, has a sheet resistance of less than about 70 ohms/square.

4. The method of claim 1, wherein said heat treating comprises thermally tempering the glass substrate to a temperature of at least about 600 degrees C.

5. The method of claim 1, further comprising forming, prior to the heat treating, a dielectric layer between said glass substrate and said film.

6. The method of claim 1, wherein the substantially transparent and electrically conductive crystalline resultant film comprising ITO has a visible transmission of at least about 70%.

7. The method of claim 1, wherein said film prior to the heat treating consists essentially of (InSn)_xO_y, wherein 0<

y<

0.5, and x=1−

y.