Electrode for use in measuring dielectric properties of parts

• US 8,519,724 B2
• Filed: 09/29/2008
• Issued: 08/27/2013
• Est. Priority Date: 10/05/2007
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Kim, Jaehyun, Sato, Arthur H., Comendant, Keith, Liu, Qing, Wu, Feiyang
• Primary Examiner(s): Maldonado, Julio J
• Assistant Examiner(s): CHOUDHRY, MOHAMMAD M
• Application Number:
  US12/240,329
• Publication Number:
  US 20090091341A1
• Time in Patent Office: 1,793 Days
• Field of Search: 438/17, 324/663, 324/681, 324/686
• US Class Current: 324/663
• CPC Class Codes: G01N 27/04 by investigating resistance
• CPC Class Codes: G01R 27/2623 Measuring-systems or electronic circuits G01R27/2635, G01R27/2682 take precedence
• CPC Class Codes: Y10T 29/49117 Conductor or circuit manufacturing

Abstract

A plate of substantially uniform thickness is formed from an electrically conductive material. The plate has a top surface defined to support a part to be measured. The plate has a bottom surface defined to be connected to a radiofrequency (RF) transmission rod such that RF power can be transmitted through the RF transmission rod to the plate. The plate is defined to have a number of holes cut vertically through the plate at a corresponding number of locations that underlie embedded conductive material items in the part to be measured when the part is positioned on the top surface of the plate.

Claims

1. An electrode system for use in measuring dielectric properties of a part, comprising:

a lower electrode plate having a top surface defined to directly support a part to be measured, wherein the top surface of the lower electrode plate is substantially flat, the lower electrode plate having a bottom surface defined to be connected to a radiofrequency (RF) transmission rod such that RF power can be transmitted through the RF transmission rod to the lower electrode plate, wherein an entirety of the lower electrode plate extending from its top surface to its bottom surface is formed from an electrically conductive material;

an upper electrode plate disposed above the lower electrode plate, the upper electrode plate configured to be moveable in a vertical direction towards and away from the lower electrode plate, the upper electrode plate formed of an electrically conductive material and electrically connected to a ground potential; and

at least three vertical positioning devices connected to a top surface of the upper electrode plate, the at least three vertical positioning devices defined to provide vertical position and angular control of the upper electrode plate such that the upper electrode plate is conformable to an angle of the part to be measured disposed between the upper electrode plate and the lower electrode plate.

2. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein both the lower electrode plate and the upper electrode plate are formed from copper metal.

3. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein a vertical thickness of the lower electrode plate from its top surface to its bottom surface is within a range extending from about 0.125 inch to about 2 inches.

4. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein a vertical thickness of the lower electrode plate from its top surface to its bottom surface is about 0.75 inch.

5. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein the lower electrode plate includes a number of alignment features defined to facilitate alignment of the part to be measured on the top surface of the lower electrode plate.

6. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein a periphery of the lower electrode plate is defined to be proximate to a periphery of the part to be measured when the part to be measured is positioned on the top surface of the lower electrode plate so as to be substantially centered on the top surface of the lower electrode plate.

7. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein the lower electrode plate is defined to be an interchangeable component within the electrode system.

14. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, further comprising:

an electrically insulating support plate, the lower electrode plate positioned on the electrically insulating support plate, the electrically insulating support plate defined to support the lower electrode plate in a substantially horizontal orientation.

15. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein the at least three vertical positioning devices is three vertical positioning devices connected to the top surface of the upper electrode plate in a triangular relationship to each other.

16. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein an entire periphery of the upper electrode plate is uniformly electrically connected to the ground potential.

17. An electrode system for use in measuring dielectric properties of a part as recited in claim 16, further comprising:

flexible electrically conductive foil connected to the entire periphery of the upper electrode plate, the flexible electrically conductive foil electrically connected to the ground potential.

18. An electrode system for use in measuring dielectric properties of a part as recited in claim 1, wherein each of the at least three vertical positioning devices includes a lifting member having a lifting rod and a disk portion attached to a lower end of the lifting rod, each of the at least three vertical positioning devices including a guide structure connected to the top surface of the upper electrode plate, the guide structure defined to receive the lifting member therein such that the lifting rod of the lifting member is movable through an access in a top of the guide structure and such that the disk portion of the lifting member is movable within the guide structure and not movable through the access in the top of the guide structure, such that vertical position control of the lifting member provides vertical position control of the upper electrode plate through engagement between the disk portion of the lifting member and the guide structure.

8. A system, comprising:

an annular dielectric component of a plasma processing system having an inner radius and an outer radius, the annular dielectric component having a planar geometry extending between a top surface and a bottom surface within the region between the inner radius and outer radius, the annular dielectric component including a plurality of electrically conductive items embedded separately from each other between the top surface and the bottom surface within the region between the inner radius and outer radius;

an electrode plate including a solid center region and a number of spokes extending radially outward from the solid center region to the outer radius of the annular dielectric component with the electrode plate and annular dielectric component substantially centered with respect to each other and with the annular dielectric component positioned on upper surfaces of the number of spokes, wherein the number of spokes are defined and spaced about the solid center region such that the number of spokes contact the annular dielectric component at locations between the plurality of electrically conductive items separately embedded within the annular dielectric component.

9. A system as recited in claim 8, wherein the solid center region and each of the number of spokes are defined to have a substantially uniform vertical thickness extending from a top surface of the electrode plate to a bottom surface of the electrode plate.

10. A system as recited in claim 9, wherein the substantially uniform vertical thickness is about 0.75 inch.

11. A system as recited in claim 8, wherein the electrode plate is formed from copper metal.

12. A system as recited in claim 8, wherein adjacent ones of the number of spokes are separated from each other by a gap within which the electrode plate is absent.

13. A system as recited in claim 8, wherein a bottom surface of the solid center region of the electrode plate includes a number of fastening devices defined to enable securing of the electrode plate to a support rod within an apparatus for measuring dielectric properties of the annular dielectric component.

19. A system as recited in claim 8, wherein each of the number of spokes and the solid center region includes a respective lower surface, and wherein the lower surface of the solid center region is defined to be connected to a radiofrequency (RF) transmission rod such that RF power can be transmitted through the RF transmission rod to the electrode plate, and wherein an entirety of the electrode plate extending from the upper surfaces of the number of spokes and the solid center region to the lower surfaces of the number spokes and the solid center region is formed from an electrically conductive material.