Immersion exposure apparatus and device manufacturing method with measuring device
First Claim
Patent Images
1. An exposure apparatus comprising:
- a projection optical system via which a substrate is exposed to an exposure beam through an immersion liquid;
a liquid supply system including a supply channel fluidly connected to a space under the projection optical system, which supplies the immersion liquid;
a first liquid recovery system including a recovery channel fluidly connected to the space which recovers the supplied immersion liquid from the space, the immersion liquid recovered from the space being disposed of without returning to the supply channel;
a liquid immersion area forming member below which the substrate is moved during the exposure, and via which the first liquid recovery system recovers the immersion liquid from the space, the liquid immersion area forming member having an opening through which the exposure beam is projected;
a first measuring system which measures at least one of a property and composition of the immersion liquid recovered from the space and discharged from the liquid immersion area forming member; and
a controller which determines whether or not to perform a cleaning of the liquid immersion area forming member based on a measurement result of the first measuring system.
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Abstract
There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
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Citations
41 Claims
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1. An exposure apparatus comprising:
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a projection optical system via which a substrate is exposed to an exposure beam through an immersion liquid; a liquid supply system including a supply channel fluidly connected to a space under the projection optical system, which supplies the immersion liquid; a first liquid recovery system including a recovery channel fluidly connected to the space which recovers the supplied immersion liquid from the space, the immersion liquid recovered from the space being disposed of without returning to the supply channel; a liquid immersion area forming member below which the substrate is moved during the exposure, and via which the first liquid recovery system recovers the immersion liquid from the space, the liquid immersion area forming member having an opening through which the exposure beam is projected; a first measuring system which measures at least one of a property and composition of the immersion liquid recovered from the space and discharged from the liquid immersion area forming member; and a controller which determines whether or not to perform a cleaning of the liquid immersion area forming member based on a measurement result of the first measuring system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. An exposure apparatus comprising:
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a projection optical system via which a substrate is exposed to an exposure beam through an immersion liquid; a liquid supply system including a supply channel fluidly connected to a space under the projection optical system, which supplies the immersion liquid; a liquid recovery system including a recovery channel fluidly connected to the space which recovers the supplied immersion liquid from the space, the immersion liquid recovered from the space being disposed of without returning to the supply channel; a liquid immersion area forming member below which the substrate is moved, and via which the supplied immersion liquid is recovered by the liquid recovery system from the space, the liquid immersion area forming member having an opening through which the exposure beam is projected a first measuring system which measures a characteristic of the immersion liquid recovered from the space and discharged from the liquid immersion area forming member; and a controller which determines whether or not to perform a cleaning of the liquid immersion area forming member based on a measurement result of the first measuring system. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A method used in a liquid immersion exposure apparatus, the method comprising:
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forming a liquid immersion area of an immersion liquid using a liquid immersion area forming member; exposing a substrate to an exposure beam through an opening of the liquid immersion area forming member disposed above the substrate, via a projection optical system of the apparatus and the immersion liquid between the projection optical system and the substrate; supplying the immersion liquid to a space under the projection optical system via a supply channel; recovering the immersion liquid from the space through the liquid immersion area forming member, the immersion liquid recovered from the space being disposed of without returning to the supply channel; and measuring at least one of a property and composition of the immersion liquid recovered from the space and discharged from the liquid immersion area forming member; and determining whether or not to perform a cleaning of the liquid immersion area forming member based on the measuring. - View Dependent Claims (29, 30, 31, 32, 33, 34)
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35. A method used in a liquid immersion exposure apparatus, the method comprising:
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forming a liquid immersion area of an immersion liquid using a liquid immersion area forming member; exposing a substrate to an exposure beam through an opening of the liquid immersion area forming member disposed above the substrate, via a projection optical system of the apparatus and the immersion liquid between the projection optical system and the substrate; supplying the immersion liquid to a space under the projection optical system via a supply channel; recovering the immersion liquid from the space through the liquid immersion area forming member, the immersion liquid recovered from the space being disposed of without returning to the supply channel; and measuring a characteristic of the immersion liquid recovered from the space and discharged from the liquid immersion area forming member; and determining whether or not to perform a cleaning of the liquid immersion area forming member based on the measuring. - View Dependent Claims (36, 37, 38, 39, 40, 41)
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Specification