Method and surface morphology of non-polar gallium nitride containing substrates
First Claim
1. A method of fabricating an optical device, the method comprising:
- providing a non-polar (10-10) gallium and nitrogen containing substrate member having a off-axis non-polar oriented crystalline surface plane, the off-axis non-polar oriented crystalline surface plane being greater in magnitude than about negative 0.6 degrees toward the c-plane (0001); and
forming a gallium and nitrogen containing epitaxial layer having a surface region substantially free of hillocks overlying the off-axis non-polar oriented crystalline surface plane.
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Abstract
An optical device, e.g., LED, laser. The device includes a non-polar gallium nitride substrate member having a slightly off-axis non-polar oriented crystalline surface plane. In a specific embodiment, the slightly off-axis non-polar oriented crystalline surface plane is up to about −0.6 degrees in a c-plane direction, but can be others. In a specific embodiment, the present invention provides a gallium nitride containing epitaxial layer formed overlying the slightly off-axis non-polar oriented crystalline surface plane. In a specific embodiment, the device includes a surface region overlying the gallium nitride epitaxial layer that is substantially free of hillocks.
150 Citations
17 Claims
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1. A method of fabricating an optical device, the method comprising:
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providing a non-polar (10-10) gallium and nitrogen containing substrate member having a off-axis non-polar oriented crystalline surface plane, the off-axis non-polar oriented crystalline surface plane being greater in magnitude than about negative 0.6 degrees toward the c-plane (0001); and forming a gallium and nitrogen containing epitaxial layer having a surface region substantially free of hillocks overlying the off-axis non-polar oriented crystalline surface plane. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of fabricating an optical device, the method comprising:
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providing a non-polar (10-10) gallium and nitrogen containing substrate member having a off axis non-polar oriented crystalline surface plane, the off-axis non-polar oriented crystalline surface plane ranging from about 0 degrees to a predetermined degree toward either or both the c-plane or a-plane; and forming a gallium and nitrogen containing epitaxial layer, using at least an atmospheric pressure process, to form a region of a quantum well having a thickness, the gallium and nitrogen containing epitaxial layer having a surface region substantially free from hillocks. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
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Specification