×

Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules

  • US 8,525,019 B2
  • Filed: 07/01/2010
  • Issued: 09/03/2013
  • Est. Priority Date: 07/01/2010
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for forming a chemically reduced conductive area in a transparent conductive layer of a thin film photovoltaic device, the method comprising:

  • providing a superstrate having a first conductive layer thereon, wherein the first conductive layer comprises a transparent conductive oxide material;

    depositing a first semiconductor layer on the first conductive layer;

    depositing a second semiconductor layer on the first semiconductor layer;

    forming a first scribe by selectively removing the first conductive layer, the first semiconductor layer, and the second semiconductor layer;

    filling the first scribe with a dielectric material;

    thereafter, exposing the superstrate to a reducing atmosphere;

    in the reducing atmosphere, directing concentrated electromagnetic energy from an energy source toward the superstrate to form a second scribe having a chemically reduced conductive area defined in the first conductive layer, wherein the chemically reduced conductive area has greater electrical conductivity than the transparent conductive oxide material; and

    thereafter, forming a second conductive layer on the second semiconductor layer and the chemically reduced conductive area.

View all claims
  • 8 Assignments
Timeline View
Assignment View
    ×
    ×