High voltage isolation and cooling for an inductively coupled plasma ion source

• US 8,525,419 B2
• Filed: 11/20/2009
• Issued: 09/03/2013
• Est. Priority Date: 11/25/2008
• Status: Active Grant

• Current Assignee: Oregon Physics LLC
• Original Assignee: Oregon Physics LLC
• Inventors: Smith, Noel S., Martin, Noel P., Tesch, Paul P.
• Primary Examiner(s): Owens, Douglas W
• Assistant Examiner(s): YANG, AMY X
• Application Number:
  US12/623,196
• Publication Number:
  US 20100126964A1
• Time in Patent Office: 1,383 Days
• Field of Search: 315/111.21, 315/111.31, 315/111.51, 315/11.81, 315/111.91, 216/68, 15634535-34547
• US Class Current: 315/111.81
• CPC Class Codes: H01J 2237/31749 Focused ion beam
• CPC Class Codes: H01J 27/16 using high-frequency excitation, e.g. microwave excitation
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns

Abstract

A plasma source for processing or imaging a substrate, for ion source for proton therapy, for ion thrusters, or for high energy particle accelerators includes a coolant circuit passing adjacent to a plasma ion reactor chamber and RF antenna coils. In a method for operating the plasma ion source having an induction coil adjacent to a reaction chamber for inductively coupling power into the plasma from a radio frequency power source, the method comprises pumping a dielectric fluid into contact with induction coils of the plasma ion source along the coolant circuit. Use of the dielectric fluid both electrically insulates the plasma chamber, so that it can be biased to 30 kV and up, and efficiently transfers heat away from the plasma chamber.

Claims

1. A plasma source comprising:

a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, as an ion source for proton therapy, as ion thrusters, or in high energy particle accelerators, the reactor chamber including outer walls that are all actively biased to a high voltage;

a gas source coupled to the reactor chamber to provide gas into the reaction chamber;

an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber;

a first source of radio frequency power;

a plurality of induction coils adjacent to the reactor chamber and coupled to said first source of radio frequency power to inductively couple power into the plasma from said first source of radio frequency power;

a coolant fluid circuit defined within the plasma source in contact with the induction coils and reactor chamber; and

a source of dielectric fluid in fluid communication with the coolant circuit wherein both the reactor chamber and induction coils are electrically isolated from each other and from ground and cooled by the dielectric fluid.

2. The plasma source of claim 1, further including a split Faraday shield interposed between the induction coils and reactor chamber, said shield being configured to capacitively shield the reactor chamber.

3. The plasma source of claim 2, wherein the split Faraday shield surrounds and is spaced from outer walls of the reaction chamber, the induction coils received within walls of the Faraday shield.

4. The plasma source of claim 1, further including a can enclosing the reaction chamber, the Faraday shield, and the induction coils, wherein the coolant fluid circuit includes a space between the can and an outer surface of the reactor chamber, a space between the Faraday shield and the reactor chamber, and a space adjacent the induction coils.

5. The plasma source of claim 1, wherein the coolant fluid is a dielectric coolant having a dielectric constant of between about 1 and 3 and a high dielectric strength of above 10 kV/mm.

6. The plasma source of claim 5, wherein the dielectric coolant is a fluorinated fluid.

7. The plasma source of claim 1, further including insulating support structures configured to electrically isolate the reactor chamber from ground.

8. The plasma source of claim 1, wherein a substantial portion of the reaction chamber is immersed into the dielectric fluid.

9. The plasma source of claim 1, further including means for extracting ions from the reactor chamber and accelerating the ions to an applied voltage.

10. A method for operating a plasma ion source having induction coils adjacent to outer walls of a reactor chamber, the method comprising:

actively biasing the reactor chamber including all outer walls to a high voltage;

electrically isolating the reactor chamber and induction coils from each other and from ground;

providing gas into the reaction chamber;

allowing extraction of ions from the reactor chamber;

inductively coupling power into the plasma from a radio frequency power source; and

pumping a dielectric fluid into contact with the induction coils and a substantial portion of the outer walls of the reactor chamber wherein both the reactor chamber and induction coils are electrically isolated and cooled by the dielectric fluid.

11. The method of claim 10, further including the step of pumping the dielectric fluid in a circuit through a plurality of spaces in fluid communication with one another, the plurality of spaces including a space adjacent the induction coils, a space adjacent outer walls of the reactor chamber, and a space adjacent a vacuum break downstream of the reaction chamber.

12. The method of claim 11, wherein the plasma ion source includes a Faraday shield enclosing the induction coils and a can enclosing the Faraday shield, reaction chamber, and vacuum break, the circuit through which dielectric fluid is pumped including a space between the can and the vacuum break and the can and plasma chamber.

13. The method of claim 11, wherein the plasma ion source includes a split Faraday shield, the method including maintaining the split Faraday shield at a ground potential.

14. The method of claim 10, further including the steps of:

maintaining different elements of the plasma ion source at different voltages; and

providing a high voltage isolation between the antenna and Faraday shield.

15. The method of claim 10, wherein the step of actively biasing the reactor chamber to a high voltage includes biasing the reactor chamber to a voltage above about 30 kV.

16. The method of claim 10, wherein the step of pumping the dielectric fluid includes pumping the fluid through a circuit into and out of the plasma ion source at a rate of between about 0.5 and 1.5 gallons per minute.

17. The method of claim 16, wherein the rate is approximately 1 gallon/minute.

18. The method of claim 10, wherein the dielectric coolant has a dielectric constant of between about 1 and 3 and a high dielectric strength of above 10 kV/mm.

19. The method of claim 18, wherein the dielectric coolant is a fluorinated fluid.