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Process for producing silicon and oxide films from organoaminosilane precursors

  • US 8,530,361 B2
  • Filed: 12/22/2010
  • Issued: 09/10/2013
  • Est. Priority Date: 05/23/2006
  • Status: Active Grant
First Claim
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1. A method for forming a silicon oxide film on a substrate comprising:

  • reacting an oxidizing agent with a precursor comprising an organoaminosilane selected from the group consisting of an organoaminosilane represented by the formulas;

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